Comparison of AlF 3 thin films grown by thermal and plasma enhanced atomic layer deposition
- NSF-PAR ID:
- 10361061
- Publisher / Repository:
- American Vacuum Society
- Date Published:
- Journal Name:
- Journal of Vacuum Science & Technology A
- Volume:
- 40
- Issue:
- 1
- ISSN:
- 0734-2101
- Page Range / eLocation ID:
- Article No. 012404
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation