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Hexagonal boron nitride (hBN) has been grown on sapphire substrates by ultrahigh-temperature molecular beam epitaxy (MBE). A wide range of substrate temperatures and boron fluxes have been explored, revealing that high crystalline quality hBN layers are grown at high substrate temperatures, >1600℃ , and low boron fluxes, ∼1 × 10%& Torr beam equivalent pressure. In situ reflection high-energy electron diffraction revealed the growth of hBN layers with 60° rotational symmetry and the [112+ 0] axis of hBN parallel to the [11+ 00] axis of the sapphire substrate. Unlike the rough, polycrystalline films previously reported, atomic force microscopy and transmission electron microscopy characterization of these films demonstrate smooth, layered, few-nanometer hBN films on a nitridated sapphire substrate. This demonstration of high-quality hBN growth by MBE is a step toward its integration into existing epitaxial growth platforms, applications, and technologies.
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Phonon Lifetimes in Boron‐Isotope‐Enriched Graphene‐ Hexagonal Boron Nitride Devices
Using hexagonal boron nitride (hBN) as a substrate for graphene has shown faster carrier cooling which makes it ideal for high‐power graphene‐based devices. However, the effect of using boron‐isotope‐enriched hBN has not been explored. Herein, femtosecond pump‐probe spectroscopy is utilized to measure and compare the time dynamics of photo‐excited carriers in graphene‐hBN heterostructures for hBN with the natural distribution of boron isotopes (20%10B and 80%11B) and hBN enriched to 100%10B and11B. The carriers cool down faster for systems with isotopically pure hBN substrates by a factor of ≈1.7 times. This difference in relaxation times arises from the interfacial coupling between carriers in graphene and the hBN phonon modes. The results show that the boron isotopic purity of the hBN substrate can help to reduce the hot phonon bottleneck that limits the cooling in graphene devices.
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- PAR ID:
- 10367933
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- physica status solidi (RRL) – Rapid Research Letters
- Volume:
- 16
- Issue:
- 6
- ISSN:
- 1862-6254
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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