Resonant tunneling diodes with negative differential resistance (NDR) have attracted significant attention due to their unique quantum resonant tunneling phenomena and potential applications in terahertz emission/detection and high‐density logic/memory. In this paper, resonant tunneling devices, where the carriers tunnel through a hexagonal boron nitride (hBN) barrier sandwiched by two black phosphorus (BP) layers, are explored. The resonance occurs when the energy bands of the two black phosphorus layers are aligned. The conductive atomic force microscopy (CAFM) measurements reveal prominent NDR peaks with large peak‐to‐valley ratios at room temperature. It is found that the positions of the NDR peaks are very sensitive to the amplitude and the shape of the voltage waveform used in CAFM, which can be explained by the charge trapping effect. Furthermore, resonant tunneling transistors are demonstrated based on BP/hBN/BP stacks in which the locations of the NDR peaks are tunable by the electrostatic gating. As compared to the traditional tunneling diodes based on bulk materials, the tunneling devices based on thin boron nitride tunneling barrier and high mobility black phosphorus offer ultra‐high‐speed response. This feature, together with the NDR characteristics, provides the potential for applications in THz oscillators and multi‐value logic devices.
Resonant tunneling is a quantum‐mechanical effect in which electron transport is controlled by the discrete energy levels within a quantum‐well (QW) structure. A ferroelectric resonant tunneling diode (RTD) exploits the switchable electric polarization state of the QW barrier to tune the device resistance. Here, the discovery of robust room‐temperature ferroelectric‐modulated resonant tunneling and negative differential resistance (NDR) behaviors in all‐perovskite‐oxide BaTiO3/SrRuO3/BaTiO3QW structures is reported. The resonant current amplitude and voltage are tunable by the switchable polarization of the BaTiO3ferroelectric with the NDR ratio modulated by ≈3 orders of magnitude and an OFF/ON resistance ratio exceeding a factor of 2 × 104. The observed NDR effect is explained an energy bandgap between Ru‐t2gand Ru‐egorbitals driven by electron–electron correlations, as follows from density functional theory calculations. This study paves the way for ferroelectric‐based quantum‐tunneling devices in future oxide electronics.
more » « less- Award ID(s):
- 2044049
- NSF-PAR ID:
- 10370375
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- Advanced Materials
- Volume:
- 34
- Issue:
- 35
- ISSN:
- 0935-9648
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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