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Title: Ultrahigh evaporative heat transfer measured locally in submicron water films
Abstract

Thin film evaporation is a widely-used thermal management solution for micro/nano-devices with high energy densities. Local measurements of the evaporation rate at a liquid-vapor interface, however, are limited. We present a continuous profile of the evaporation heat transfer coefficient ($$h_{\text {evap}}$$hevap) in the submicron thin film region of a water meniscus obtained through local measurements interpreted by a machine learned surrogate of the physical system. Frequency domain thermoreflectance (FDTR), a non-contact laser-based method with micrometer lateral resolution, is used to induce and measure the meniscus evaporation. A neural network is then trained using finite element simulations to extract the$$h_{\text {evap}}$$hevapprofile from the FDTR data. For a substrate superheat of 20 K, the maximum$$h_{\text {evap}}$$hevapis$$1.0_{-0.3}^{+0.5}$$1.0-0.3+0.5 MW/$$\text {m}^2$$m2-K at a film thickness of$$15_{-3}^{+29}$$15-3+29 nm. This ultrahigh$$h_{\text {evap}}$$hevapvalue is two orders of magnitude larger than the heat transfer coefficient for single-phase forced convection or evaporation from a bulk liquid. Under the assumption of constant wall temperature, our profiles of$$h_{\text {evap}}$$hevapand meniscus thickness suggest that 62% of the heat transfer comes from the region lying 0.1–1 μm from the meniscus edge, whereas just 29% comes from the next 100 μm.

Authors:
; ; ; ;
Publication Date:
NSF-PAR ID:
10387854
Journal Name:
Scientific Reports
Volume:
12
Issue:
1
ISSN:
2045-2322
Publisher:
Nature Publishing Group
Sponsoring Org:
National Science Foundation
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