The switching performance of unpackaged vertical geometry NiO/ β -Ga 2 O 3 rectifiers with a reverse breakdown voltage of 1.76 kV (0.1 cm diameter, 7.85 × 10 −3 cm 2 area) and an absolute forward current of 1.9 A fabricated on 20 μ m thick epitaxial β -Ga 2 O 3 drift layers and a double layer of NiO to optimize breakdown and contact resistance was measured with an inductive load test circuit. The Baliga figure-of-merit of the devices was 261 MW.cm −2 , with differential on-state resistance of 11.86 mΩ.cm 2 . The recovery characteristics for these rectifiers switching from forward current of 1 A to reverse off-state voltage of −550 V showed a measurement-parasitic-limited recovery time (t rr ) of 101 ns, with a peak current value of 1.4 A for switching from 640 V. The reverse recovery time was limited by extrinsic parasitic and thus does not represent the intrinsic device characteristics. There was no significant dependence of t rr on switching voltage or forward current.
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This content will become publicly available on May 1, 2024
NiO/β-(Al x Ga 1−x ) 2 O 3 /Ga 2 O 3 heterojunction lateral rectifiers with reverse breakdown voltage >7 kV
NiO/β-(Al x Ga 1− x ) 2 O 3 /Ga 2 O 3 heterojunction lateral geometry rectifiers with diameter 50–100 μm exhibited maximum reverse breakdown voltages >7 kV, showing the advantage of increasing the bandgap using the β-(Al x Ga 1− x ) 2 O 3 alloy. This Si-doped alloy layer was grown by metal organic chemical vapor deposition with an Al composition of ∼21%. On-state resistances were in the range of 50–2180 Ω cm 2 , leading to power figures-of-merit up to 0.72 MW cm −2 . The forward turn-on voltage was in the range of 2.3–2.5 V, with maximum on/off ratios >700 when switching from 5 V forward to reverse biases up to −100 V. Transmission line measurements showed the specific contact resistance was 0.12 Ω cm 2 . The breakdown voltage is among the highest reported for any lateral geometry Ga 2 O 3 -based rectifier.
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- Award ID(s):
- 1856662
- NSF-PAR ID:
- 10400690
- Date Published:
- Journal Name:
- Journal of Vacuum Science & Technology A
- Volume:
- 41
- Issue:
- 3
- ISSN:
- 0734-2101
- Page Range / eLocation ID:
- 032701
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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Vertical heterojunction NiO/β n-Ga 2 O/n + Ga 2 O 3 rectifiers employing NiO layer extension beyond the rectifying contact for edge termination exhibit breakdown voltages (V B ) up to 4.7 kV with a power figure-of-merits, V B 2 /R ON of 2 GW·cm −2 , where R ON is the on-state resistance (11.3 mΩ cm 2 ). Conventional rectifiers fabricated on the same wafers without NiO showed V B values of 840 V and a power figure-of-merit of 0.11 GW cm −2 . Optimization of the design of the two-layer NiO doping and thickness and also the extension beyond the rectifying contact by TCAD showed that the peak electric field at the edge of the rectifying contact could be significantly reduced. The leakage current density before breakdown was 144 mA/cm 2 , the forward current density was 0.8 kA/cm 2 at 12 V, and the turn-on voltage was in the range of 2.2–2.4 V compared to 0.8 V without NiO. Transmission electron microscopy showed sharp interfaces between NiO and epitaxial Ga 2 O 3 and a small amount of disorder from the sputtering process.more » « less
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