Beaucejour, Rossiny, Roebisch, Volker, Kochhar, Abhay, Moe, Craig G., Hodge, Michael David, and Olsson, Roy H. Controlling Residual Stress and Suppression of Anomalous Grains in Aluminum Scandium Nitride Films Grown Directly on Silicon. Retrieved from https://par.nsf.gov/biblio/10400753. Journal of Microelectromechanical Systems 31.4 Web. doi:10.1109/JMEMS.2022.3167430.

Beaucejour, Rossiny, Roebisch, Volker, Kochhar, Abhay, Moe, Craig G., Hodge, Michael David, & Olsson, Roy H. Controlling Residual Stress and Suppression of Anomalous Grains in Aluminum Scandium Nitride Films Grown Directly on Silicon. Journal of Microelectromechanical Systems, 31 (4). Retrieved from https://par.nsf.gov/biblio/10400753. https://doi.org/10.1109/JMEMS.2022.3167430

Beaucejour, Rossiny, Roebisch, Volker, Kochhar, Abhay, Moe, Craig G., Hodge, Michael David, and Olsson, Roy H. "Controlling Residual Stress and Suppression of Anomalous Grains in Aluminum Scandium Nitride Films Grown Directly on Silicon". Journal of Microelectromechanical Systems 31 (4). Country unknown/Code not available. https://doi.org/10.1109/JMEMS.2022.3167430. https://par.nsf.gov/biblio/10400753.

@article{osti_10400753,
place = {Country unknown/Code not available}, title = {Controlling Residual Stress and Suppression of Anomalous Grains in Aluminum Scandium Nitride Films Grown Directly on Silicon}, url = {https://par.nsf.gov/biblio/10400753}, DOI = {10.1109/JMEMS.2022.3167430}, abstractNote = {}, journal = {Journal of Microelectromechanical Systems}, volume = {31}, number = {4}, author = {Beaucejour, Rossiny and Roebisch, Volker and Kochhar, Abhay and Moe, Craig G. and Hodge, Michael David and Olsson, Roy H.}, }