Sutherland, Duncan R.; Merrill, Devin R.; Ditto, Jeffrey; Moore, Daniel B.; Medlin, Douglas; Johnson, David C.
(, Journal of the American Chemical Society)
Sil, Aritra, Goldfine, Elise A., Huang, Wei, Bedzyk, Michael J., Medvedeva, Julia E., Facchetti, Antonio, and Marks, Tobin J. Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrO x Dielectric Films. Retrieved from https://par.nsf.gov/biblio/10402364. ACS Applied Materials & Interfaces 14.10 Web. doi:10.1021/acsami.1c22853.
Sil, Aritra, Goldfine, Elise A., Huang, Wei, Bedzyk, Michael J., Medvedeva, Julia E., Facchetti, Antonio, & Marks, Tobin J. Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrO x Dielectric Films. ACS Applied Materials & Interfaces, 14 (10). Retrieved from https://par.nsf.gov/biblio/10402364. https://doi.org/10.1021/acsami.1c22853
Sil, Aritra, Goldfine, Elise A., Huang, Wei, Bedzyk, Michael J., Medvedeva, Julia E., Facchetti, Antonio, and Marks, Tobin J.
"Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrO x Dielectric Films". ACS Applied Materials & Interfaces 14 (10). Country unknown/Code not available. https://doi.org/10.1021/acsami.1c22853.https://par.nsf.gov/biblio/10402364.
@article{osti_10402364,
place = {Country unknown/Code not available},
title = {Role of Fluoride Doping in Low-Temperature Combustion-Synthesized ZrO x Dielectric Films},
url = {https://par.nsf.gov/biblio/10402364},
DOI = {10.1021/acsami.1c22853},
abstractNote = {},
journal = {ACS Applied Materials & Interfaces},
volume = {14},
number = {10},
author = {Sil, Aritra and Goldfine, Elise A. and Huang, Wei and Bedzyk, Michael J. and Medvedeva, Julia E. and Facchetti, Antonio and Marks, Tobin J.},
}
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