Nowik-Boltyk, Ewa Malgorzata, Junghoefer, Tobias, Glaser, Mathias, Giangrisostomi, Erika, Ovsyannikov, Ruslan, Zhang, Shuyang, Shu, Chan, Rajca, Andrzej, Calzolari, Arrigo, and Casu, M. Benedetta. Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films. ACS Applied Materials & Interfaces 15.25 Web. doi:10.1021/acsami.3c02057.

Nowik-Boltyk, Ewa Malgorzata, Junghoefer, Tobias, Glaser, Mathias, Giangrisostomi, Erika, Ovsyannikov, Ruslan, Zhang, Shuyang, Shu, Chan, Rajca, Andrzej, Calzolari, Arrigo, & Casu, M. Benedetta. Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films. ACS Applied Materials & Interfaces, 15 (25). https://doi.org/10.1021/acsami.3c02057

Nowik-Boltyk, Ewa Malgorzata, Junghoefer, Tobias, Glaser, Mathias, Giangrisostomi, Erika, Ovsyannikov, Ruslan, Zhang, Shuyang, Shu, Chan, Rajca, Andrzej, Calzolari, Arrigo, and Casu, M. Benedetta. "Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films". ACS Applied Materials & Interfaces 15 (25). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsami.3c02057. https://par.nsf.gov/biblio/10422818.

@article{osti_10422818,
place = {Country unknown/Code not available}, title = {Long-Term Degradation Mechanisms in Application-Implemented Radical Thin Films}, url = {https://par.nsf.gov/biblio/10422818}, DOI = {10.1021/acsami.3c02057}, abstractNote = {Not Available}, journal = {ACS Applied Materials & Interfaces}, volume = {15}, number = {25}, publisher = {American Chemical Society}, author = {Nowik-Boltyk, Ewa Malgorzata and Junghoefer, Tobias and Glaser, Mathias and Giangrisostomi, Erika and Ovsyannikov, Ruslan and Zhang, Shuyang and Shu, Chan and Rajca, Andrzej and Calzolari, Arrigo and Casu, M. Benedetta}, }