Nguyen, Bryan, Tabarkhoon, Farnaz, Welchert, Nicholas A., Hu, Sheng, Gupta, Malancha, and Tsotsis, Theodore. Fabrication of SiC-Type Films Using Low-Energy Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Subsequent Pyrolysis. Retrieved from https://par.nsf.gov/biblio/10424459. Industrial & Engineering Chemistry Research 62.24 Web. doi:10.1021/acs.iecr.2c04656.

Nguyen, Bryan, Tabarkhoon, Farnaz, Welchert, Nicholas A., Hu, Sheng, Gupta, Malancha, & Tsotsis, Theodore. Fabrication of SiC-Type Films Using Low-Energy Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Subsequent Pyrolysis. Industrial & Engineering Chemistry Research, 62 (24). Retrieved from https://par.nsf.gov/biblio/10424459. https://doi.org/10.1021/acs.iecr.2c04656

Nguyen, Bryan, Tabarkhoon, Farnaz, Welchert, Nicholas A., Hu, Sheng, Gupta, Malancha, and Tsotsis, Theodore. "Fabrication of SiC-Type Films Using Low-Energy Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Subsequent Pyrolysis". Industrial & Engineering Chemistry Research 62 (24). Country unknown/Code not available. https://doi.org/10.1021/acs.iecr.2c04656. https://par.nsf.gov/biblio/10424459.

@article{osti_10424459,
place = {Country unknown/Code not available}, title = {Fabrication of SiC-Type Films Using Low-Energy Plasma-Enhanced Chemical Vapor Deposition (PECVD) and Subsequent Pyrolysis}, url = {https://par.nsf.gov/biblio/10424459}, DOI = {10.1021/acs.iecr.2c04656}, abstractNote = {}, journal = {Industrial & Engineering Chemistry Research}, volume = {62}, number = {24}, author = {Nguyen, Bryan and Tabarkhoon, Farnaz and Welchert, Nicholas A. and Hu, Sheng and Gupta, Malancha and Tsotsis, Theodore}, }