Pellitero, Miguel_Aller, Jensen, Isabel_M, Dominique, Nathaniel_L, Ekowo, Lilian_Chinenye, Camden, Jon_P, Jenkins, David_M, and Arroyo-Currás, Netzahualcóyotl. Stability of N-Heterocyclic Carbene Monolayers under Continuous Voltammetric Interrogation. ACS Applied Materials & Interfaces 15.29 Web. doi:10.1021/acsami.3c06148.

Pellitero, Miguel_Aller, Jensen, Isabel_M, Dominique, Nathaniel_L, Ekowo, Lilian_Chinenye, Camden, Jon_P, Jenkins, David_M, & Arroyo-Currás, Netzahualcóyotl. Stability of N-Heterocyclic Carbene Monolayers under Continuous Voltammetric Interrogation. ACS Applied Materials & Interfaces, 15 (29). https://doi.org/10.1021/acsami.3c06148

Pellitero, Miguel_Aller, Jensen, Isabel_M, Dominique, Nathaniel_L, Ekowo, Lilian_Chinenye, Camden, Jon_P, Jenkins, David_M, and Arroyo-Currás, Netzahualcóyotl. "Stability of N-Heterocyclic Carbene Monolayers under Continuous Voltammetric Interrogation". ACS Applied Materials & Interfaces 15 (29). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsami.3c06148. https://par.nsf.gov/biblio/10431918.

@article{osti_10431918,
place = {Country unknown/Code not available}, title = {Stability of N-Heterocyclic Carbene Monolayers under Continuous Voltammetric Interrogation}, url = {https://par.nsf.gov/biblio/10431918}, DOI = {10.1021/acsami.3c06148}, abstractNote = {Not Available}, journal = {ACS Applied Materials & Interfaces}, volume = {15}, number = {29}, publisher = {American Chemical Society}, author = {Pellitero, Miguel_Aller and Jensen, Isabel_M and Dominique, Nathaniel_L and Ekowo, Lilian_Chinenye and Camden, Jon_P and Jenkins, David_M and Arroyo-Currás, Netzahualcóyotl}, }