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Title: Diffusion-assisted molecular beam epitaxy of CuCrO2 thin films

Using molecular beam epitaxy (MBE) to grow multielemental oxides (MEOs) is generally challenging, partly due to difficulty in stoichiometry control. Occasionally, if one of the elements is volatile at the growth temperature, stoichiometry control can be greatly simplified using adsorption-controlled growth mode. Otherwise, stoichiometry control remains one of the main hurdles to achieving high-quality MEO film growths. Here, we report another kind of self-limited growth mode, dubbed diffusion-assisted epitaxy, in which excess species diffuses into the substrate and leads to the desired stoichiometry, in a manner similar to the conventional adsorption-controlled epitaxy. Specifically, we demonstrate that using diffusion-assisted epitaxy, high-quality epitaxial CuCrO2 films can be grown over a wide growth window without precise flux control using MBE.

 
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Award ID(s):
2004125
NSF-PAR ID:
10440330
Author(s) / Creator(s):
; ; ;
Publisher / Repository:
American Vacuum Society
Date Published:
Journal Name:
Journal of Vacuum Science & Technology A
Volume:
40
Issue:
6
ISSN:
0734-2101
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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