Burns, Randy, Ngqoloda, Siphelo, Klue, Stephen C., Karapetrova, Evguenia, Arendse, Christopher J., and Guha, Suchismita. Temperature-Dependent Phase Stable Hybrid Halide Perovskite Films by Chemical Vapor Deposition. Retrieved from https://par.nsf.gov/biblio/10450529. ACS Applied Electronic Materials 4.9 Web. doi:10.1021/acsaelm.2c00449.

Burns, Randy, Ngqoloda, Siphelo, Klue, Stephen C., Karapetrova, Evguenia, Arendse, Christopher J., & Guha, Suchismita. Temperature-Dependent Phase Stable Hybrid Halide Perovskite Films by Chemical Vapor Deposition. ACS Applied Electronic Materials, 4 (9). Retrieved from https://par.nsf.gov/biblio/10450529. https://doi.org/10.1021/acsaelm.2c00449

Burns, Randy, Ngqoloda, Siphelo, Klue, Stephen C., Karapetrova, Evguenia, Arendse, Christopher J., and Guha, Suchismita. "Temperature-Dependent Phase Stable Hybrid Halide Perovskite Films by Chemical Vapor Deposition". ACS Applied Electronic Materials 4 (9). Country unknown/Code not available. https://doi.org/10.1021/acsaelm.2c00449. https://par.nsf.gov/biblio/10450529.

@article{osti_10450529,
place = {Country unknown/Code not available}, title = {Temperature-Dependent Phase Stable Hybrid Halide Perovskite Films by Chemical Vapor Deposition}, url = {https://par.nsf.gov/biblio/10450529}, DOI = {10.1021/acsaelm.2c00449}, abstractNote = {}, journal = {ACS Applied Electronic Materials}, volume = {4}, number = {9}, author = {Burns, Randy and Ngqoloda, Siphelo and Klue, Stephen C. and Karapetrova, Evguenia and Arendse, Christopher J. and Guha, Suchismita}, }