Pedersen, Henrik, Hsu, Chih-Wei, Nepal, Neeraj, Woodward, Jeffrey M., and Eddy, Jr, Charles R. Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys. Crystal Growth & Design 23.10 Web. doi:10.1021/acs.cgd.3c00775.

Pedersen, Henrik, Hsu, Chih-Wei, Nepal, Neeraj, Woodward, Jeffrey M., & Eddy, Jr, Charles R. Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys. Crystal Growth & Design, 23 (10). https://doi.org/10.1021/acs.cgd.3c00775

Pedersen, Henrik, Hsu, Chih-Wei, Nepal, Neeraj, Woodward, Jeffrey M., and Eddy, Jr, Charles R. "Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys". Crystal Growth & Design 23 (10). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acs.cgd.3c00775. https://par.nsf.gov/biblio/10463817.

@article{osti_10463817,
place = {Country unknown/Code not available}, title = {Atomic Layer Deposition as the Enabler for the Metastable Semiconductor InN and Its Alloys}, url = {https://par.nsf.gov/biblio/10463817}, DOI = {10.1021/acs.cgd.3c00775}, abstractNote = {Not Available}, journal = {Crystal Growth & Design}, volume = {23}, number = {10}, publisher = {American Chemical Society}, author = {Pedersen, Henrik and Hsu, Chih-Wei and Nepal, Neeraj and Woodward, Jeffrey M. and Eddy, Jr, Charles R.}, }