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This content will become publicly available on September 1, 2024

Title: Computational fluid dynamics modeling of a wafer etch temperature control system
Award ID(s):
1932026 1839675
NSF-PAR ID:
10466329
Author(s) / Creator(s):
; ; ; ; ;
Date Published:
Journal Name:
Digital Chemical Engineering
Volume:
8
Issue:
C
ISSN:
2772-5081
Page Range / eLocation ID:
100102
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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