Hui, Liwei, Nixon, Rachel, Tolman, Nathan, Mukai, Jason, Bai, Ruobing, Wang, Risheng, and Liu, Haitao. Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications. Retrieved from https://par.nsf.gov/biblio/10480463. ACS Nano 14.10 Web. doi:10.1021/acsnano.0c04493.

Hui, Liwei, Nixon, Rachel, Tolman, Nathan, Mukai, Jason, Bai, Ruobing, Wang, Risheng, & Liu, Haitao. Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications. ACS Nano, 14 (10). Retrieved from https://par.nsf.gov/biblio/10480463. https://doi.org/10.1021/acsnano.0c04493

Hui, Liwei, Nixon, Rachel, Tolman, Nathan, Mukai, Jason, Bai, Ruobing, Wang, Risheng, and Liu, Haitao. "Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications". ACS Nano 14 (10). Country unknown/Code not available: ACS publications. https://doi.org/10.1021/acsnano.0c04493. https://par.nsf.gov/biblio/10480463.

@article{osti_10480463,
place = {Country unknown/Code not available}, title = {Area-Selective Atomic Layer Deposition of Metal Oxides on DNA Nanostructures and Its Applications}, url = {https://par.nsf.gov/biblio/10480463}, DOI = {10.1021/acsnano.0c04493}, abstractNote = {}, journal = {ACS Nano}, volume = {14}, number = {10}, publisher = {ACS publications}, author = {Hui, Liwei and Nixon, Rachel and Tolman, Nathan and Mukai, Jason and Bai, Ruobing and Wang, Risheng and Liu, Haitao}, }