Jia, Sixian, Sun, Jieliyue, Howes, Andrew, Dawson, Michelle R., Toussaint, Kimani C., and Shao, Chenhui. Hybrid physics-guided data-driven modeling for generalizable geometric accuracy prediction and improvement in two-photon lithography. Retrieved from https://par.nsf.gov/biblio/10484976. Journal of Manufacturing Processes 110.C Web. doi:10.1016/j.jmapro.2023.12.024.

Jia, Sixian, Sun, Jieliyue, Howes, Andrew, Dawson, Michelle R., Toussaint, Kimani C., & Shao, Chenhui. Hybrid physics-guided data-driven modeling for generalizable geometric accuracy prediction and improvement in two-photon lithography. Journal of Manufacturing Processes, 110 (C). Retrieved from https://par.nsf.gov/biblio/10484976. https://doi.org/10.1016/j.jmapro.2023.12.024

Jia, Sixian, Sun, Jieliyue, Howes, Andrew, Dawson, Michelle R., Toussaint, Kimani C., and Shao, Chenhui. "Hybrid physics-guided data-driven modeling for generalizable geometric accuracy prediction and improvement in two-photon lithography". Journal of Manufacturing Processes 110 (C). Country unknown/Code not available: Elsevier. https://doi.org/10.1016/j.jmapro.2023.12.024. https://par.nsf.gov/biblio/10484976.

@article{osti_10484976,
place = {Country unknown/Code not available}, title = {Hybrid physics-guided data-driven modeling for generalizable geometric accuracy prediction and improvement in two-photon lithography}, url = {https://par.nsf.gov/biblio/10484976}, DOI = {10.1016/j.jmapro.2023.12.024}, abstractNote = {}, journal = {Journal of Manufacturing Processes}, volume = {110}, number = {C}, publisher = {Elsevier}, author = {Jia, Sixian and Sun, Jieliyue and Howes, Andrew and Dawson, Michelle R. and Toussaint, Kimani C. and Shao, Chenhui}, }