Cohen, Asaf, Li, Junying, Cohen, Hagai, Kaplan-Ashiri, Ifat, Khodorov, Sergey, Wachtel, Ellen_J, Lubomirsky, Igor, Frenkel, Anatoly_I, and Ehre, David. Local Environment of Sc and Y Dopant Ions in Aluminum Nitride Thin Films. ACS Applied Electronic Materials 6.2 Web. doi:10.1021/acsaelm.3c01390.

Cohen, Asaf, Li, Junying, Cohen, Hagai, Kaplan-Ashiri, Ifat, Khodorov, Sergey, Wachtel, Ellen_J, Lubomirsky, Igor, Frenkel, Anatoly_I, & Ehre, David. Local Environment of Sc and Y Dopant Ions in Aluminum Nitride Thin Films. ACS Applied Electronic Materials, 6 (2). https://doi.org/10.1021/acsaelm.3c01390

Cohen, Asaf, Li, Junying, Cohen, Hagai, Kaplan-Ashiri, Ifat, Khodorov, Sergey, Wachtel, Ellen_J, Lubomirsky, Igor, Frenkel, Anatoly_I, and Ehre, David. "Local Environment of Sc and Y Dopant Ions in Aluminum Nitride Thin Films". ACS Applied Electronic Materials 6 (2). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsaelm.3c01390. https://par.nsf.gov/biblio/10486706.

@article{osti_10486706,
place = {Country unknown/Code not available}, title = {Local Environment of Sc and Y Dopant Ions in Aluminum Nitride Thin Films}, url = {https://par.nsf.gov/biblio/10486706}, DOI = {10.1021/acsaelm.3c01390}, abstractNote = {Not Available}, journal = {ACS Applied Electronic Materials}, volume = {6}, number = {2}, publisher = {American Chemical Society}, author = {Cohen, Asaf and Li, Junying and Cohen, Hagai and Kaplan-Ashiri, Ifat and Khodorov, Sergey and Wachtel, Ellen_J and Lubomirsky, Igor and Frenkel, Anatoly_I and Ehre, David}, }