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Gallium oxide (β-Ga 2 O 3 ) is becoming a popular material for high power electronic devices due to its wide bandgap and ease of processing. In this work, β-Ga 2 O 3 substrates received various annealing treatments before atomic layer deposition of HfO 2 and subsequent fabrication of metal–oxide–semiconductor (MOS) capacitors. Annealing of β-Ga 2 O 3 with forming gas or nitrogen produced degraded capacitance–voltage (C–V) behavior compared to a β-Ga 2 O 3 control sample with no annealing. A sample annealed with pure oxygen had improved C–V characteristics relative to the control sample, with a higher maximum capacitance and smaller flat-band voltage shift, indicating that oxygen annealing improved the C–V behavior. X-ray photoelectron spectroscopy also suggested a reduction in the oxygen vacancy concentration after O 2 annealing at 450 °C, which supports the improved C–V characteristics and indicates that O 2 annealing of β-Ga 2 O 3 may lead to better MOS device performance.
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Physical adsorption and oxidation of ultra-thin MoS 2 crystals: insights into surface engineering for 2D electronics and beyond
Abstract The oxidation mechanism of atomically thin molybdenum disulfide (MoS2) plays a critical role in its nanoelectronics, optoelectronics, and catalytic applications, where devices often operate in an elevated thermal environment. In this study, we systematically investigate the oxidation of mono- and few-layer MoS2flakes in the air at temperatures ranging from 23 °C to 525 °C and relative humidities of 10%–60% by using atomic force microscopy (AFM), Raman spectroscopy and x-ray photoelectron spectroscopy. Our study reveals the formation of a uniform nanometer-thick physical adsorption layer on the surface of MoS2, which is attributed to the adsorption of ambient moisture. This physical adsorption layer acts as a thermal shield of the underlying MoS2lattice to enhance its thermal stability and can be effectively removed by an AFM tip scanning in contact mode or annealing at 400 °C. Our study shows that high-temperature thermal annealing and AFM tip-based cleaning result in chemical adsorption on sulfur vacancies in MoS2, leading to p-type doping. Our study highlights the importance of humidity control in ensuring reliable and optimal performance for MoS2-based electronic and electrochemical devices and provides crucial insights into the surface engineering of MoS2, which are relevant to the study of other two-dimensional transition metal dichalcogenide materials and their applications.
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- Award ID(s):
- 2006127
- PAR ID:
- 10487419
- Publisher / Repository:
- IOP Publishing
- Date Published:
- Journal Name:
- Nanotechnology
- Volume:
- 34
- Issue:
- 40
- ISSN:
- 0957-4484
- Format(s):
- Medium: X Size: Article No. 405701
- Size(s):
- Article No. 405701
- Sponsoring Org:
- National Science Foundation
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