skip to main content
US FlagAn official website of the United States government
dot gov icon
Official websites use .gov
A .gov website belongs to an official government organization in the United States.
https lock icon
Secure .gov websites use HTTPS
A lock ( lock ) or https:// means you've safely connected to the .gov website. Share sensitive information only on official, secure websites.

Explore Research Products in the PAR
It may take a few hours for recently added research products to appear in PAR search results.


  • NSF Public Access
  • Search Results
  • Investigation of plasma etching for interlayer dielectric planarization in high-efficiency deep-ultraviolet nanowire LEDs
Title: Investigation of plasma etching for interlayer dielectric planarization in high-efficiency deep-ultraviolet nanowire LEDs
Award ID(s):
1751675
PAR ID:
10493796
Author(s) / Creator(s):
; ;
Publisher / Repository:
SPIE
Date Published:
ISBN:
9781510659711
Page Range / eLocation ID:
41
Format(s):
Medium: X
Location:
San Francisco, United States
Sponsoring Org:
National Science Foundation
More Like this
No document suggestions found
  • Citation Formats
  • MLA
  • APA
  • Chicago
  • BibTeX
  • Save / Share this Record
  • Send to Email