Kim, Nayeong, Jeyaraj, Vijaya_S, Elbert, Johannes, Seo, Sung_Jin, Mironenko, Alexander_V, and Su, Xiao. Redox-Responsive Halogen Bonding as a Highly Selective Interaction for Electrochemical Separations. JACS Au 4.7 Web. doi:10.1021/jacsau.4c00265.

Kim, Nayeong, Jeyaraj, Vijaya_S, Elbert, Johannes, Seo, Sung_Jin, Mironenko, Alexander_V, & Su, Xiao. Redox-Responsive Halogen Bonding as a Highly Selective Interaction for Electrochemical Separations. JACS Au, 4 (7). https://doi.org/10.1021/jacsau.4c00265

Kim, Nayeong, Jeyaraj, Vijaya_S, Elbert, Johannes, Seo, Sung_Jin, Mironenko, Alexander_V, and Su, Xiao. "Redox-Responsive Halogen Bonding as a Highly Selective Interaction for Electrochemical Separations". JACS Au 4 (7). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/jacsau.4c00265. https://par.nsf.gov/biblio/10513565.

@article{osti_10513565,
place = {Country unknown/Code not available}, title = {Redox-Responsive Halogen Bonding as a Highly Selective Interaction for Electrochemical Separations}, url = {https://par.nsf.gov/biblio/10513565}, DOI = {10.1021/jacsau.4c00265}, abstractNote = {Not Available}, journal = {JACS Au}, volume = {4}, number = {7}, publisher = {American Chemical Society}, author = {Kim, Nayeong and Jeyaraj, Vijaya_S and Elbert, Johannes and Seo, Sung_Jin and Mironenko, Alexander_V and Su, Xiao}, }