Diulus, J Trey, Naclerio, Andrew E, Boscoboinik, Jorge Anibal, Head, Ashley R, Strelcov, Evgheni, Kidambi, Piran R, and Kolmakov, Andrei. Operando XPS for Plasma Process Monitoring: A Case Study on the Hydrogenation of Copper Oxide Confined under h-BN. Retrieved from https://par.nsf.gov/biblio/10516083. The Journal of Physical Chemistry C 128.18 Web. doi:10.1021/acs.jpcc.4c00253.

Diulus, J Trey, Naclerio, Andrew E, Boscoboinik, Jorge Anibal, Head, Ashley R, Strelcov, Evgheni, Kidambi, Piran R, & Kolmakov, Andrei. Operando XPS for Plasma Process Monitoring: A Case Study on the Hydrogenation of Copper Oxide Confined under h-BN. The Journal of Physical Chemistry C, 128 (18). Retrieved from https://par.nsf.gov/biblio/10516083. https://doi.org/10.1021/acs.jpcc.4c00253

Diulus, J Trey, Naclerio, Andrew E, Boscoboinik, Jorge Anibal, Head, Ashley R, Strelcov, Evgheni, Kidambi, Piran R, and Kolmakov, Andrei. "Operando XPS for Plasma Process Monitoring: A Case Study on the Hydrogenation of Copper Oxide Confined under h-BN". The Journal of Physical Chemistry C 128 (18). Country unknown/Code not available: ACS. https://doi.org/10.1021/acs.jpcc.4c00253. https://par.nsf.gov/biblio/10516083.

@article{osti_10516083,
place = {Country unknown/Code not available}, title = {Operando XPS for Plasma Process Monitoring: A Case Study on the Hydrogenation of Copper Oxide Confined under h-BN}, url = {https://par.nsf.gov/biblio/10516083}, DOI = {10.1021/acs.jpcc.4c00253}, abstractNote = {}, journal = {The Journal of Physical Chemistry C}, volume = {128}, number = {18}, publisher = {ACS}, author = {Diulus, J Trey and Naclerio, Andrew E and Boscoboinik, Jorge Anibal and Head, Ashley R and Strelcov, Evgheni and Kidambi, Piran R and Kolmakov, Andrei}, }