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Title: Effects of Y and Ho doping on microstructure evolution during oxidation of extraordinary stable Hf-B-Si-Y/Ho-C-N films up to 1500 °C
Award ID(s):
2122128
PAR ID:
10520789
Author(s) / Creator(s):
; ; ; ; ;
Publisher / Repository:
Elsevier
Date Published:
Journal Name:
Materials & Design
Volume:
237
Issue:
C
ISSN:
0264-1275
Page Range / eLocation ID:
112589
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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