Kim, Bum_Jun, Tseng, Derick, Dang, David, Liang, Jiayun, Soukhoveev, Vitali, Osinsky, Andrei, Wang, Ke, Lee, Ho_Wai_Howard, and Al_Balushi, Zakaria_Y. Phase Controlled Metalorganic Chemical Vapor Deposition Growth of Wafer-Scale Molybdenum Ditelluride. ACS Nanoscience Au 5.1 Web. doi:10.1021/acsnanoscienceau.4c00050.

Kim, Bum_Jun, Tseng, Derick, Dang, David, Liang, Jiayun, Soukhoveev, Vitali, Osinsky, Andrei, Wang, Ke, Lee, Ho_Wai_Howard, & Al_Balushi, Zakaria_Y. Phase Controlled Metalorganic Chemical Vapor Deposition Growth of Wafer-Scale Molybdenum Ditelluride. ACS Nanoscience Au, 5 (1). https://doi.org/10.1021/acsnanoscienceau.4c00050

Kim, Bum_Jun, Tseng, Derick, Dang, David, Liang, Jiayun, Soukhoveev, Vitali, Osinsky, Andrei, Wang, Ke, Lee, Ho_Wai_Howard, and Al_Balushi, Zakaria_Y. "Phase Controlled Metalorganic Chemical Vapor Deposition Growth of Wafer-Scale Molybdenum Ditelluride". ACS Nanoscience Au 5 (1). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsnanoscienceau.4c00050. https://par.nsf.gov/biblio/10566386.

@article{osti_10566386,
place = {Country unknown/Code not available}, title = {Phase Controlled Metalorganic Chemical Vapor Deposition Growth of Wafer-Scale Molybdenum Ditelluride}, url = {https://par.nsf.gov/biblio/10566386}, DOI = {10.1021/acsnanoscienceau.4c00050}, abstractNote = {Not Available}, journal = {ACS Nanoscience Au}, volume = {5}, number = {1}, publisher = {American Chemical Society}, author = {Kim, Bum_Jun and Tseng, Derick and Dang, David and Liang, Jiayun and Soukhoveev, Vitali and Osinsky, Andrei and Wang, Ke and Lee, Ho_Wai_Howard and Al_Balushi, Zakaria_Y}, }