Sikulskyi, Stanislav, Srinivasaraghavan_Govindarajan, Rishikesh, Stark, Taylor, Ren, Zefu, Reed, Nicholas, and Kim, Daewon. Two-photon polymerized wetting morphologies for tunable external and internal electrode micropatterning. Retrieved from https://par.nsf.gov/biblio/10567097. Additive Manufacturing 86.C Web. doi:10.1016/j.addma.2024.104220.

Sikulskyi, Stanislav, Srinivasaraghavan_Govindarajan, Rishikesh, Stark, Taylor, Ren, Zefu, Reed, Nicholas, & Kim, Daewon. Two-photon polymerized wetting morphologies for tunable external and internal electrode micropatterning. Additive Manufacturing, 86 (C). Retrieved from https://par.nsf.gov/biblio/10567097. https://doi.org/10.1016/j.addma.2024.104220

Sikulskyi, Stanislav, Srinivasaraghavan_Govindarajan, Rishikesh, Stark, Taylor, Ren, Zefu, Reed, Nicholas, and Kim, Daewon. "Two-photon polymerized wetting morphologies for tunable external and internal electrode micropatterning". Additive Manufacturing 86 (C). Country unknown/Code not available: Elsevier. https://doi.org/10.1016/j.addma.2024.104220. https://par.nsf.gov/biblio/10567097.

@article{osti_10567097,
place = {Country unknown/Code not available}, title = {Two-photon polymerized wetting morphologies for tunable external and internal electrode micropatterning}, url = {https://par.nsf.gov/biblio/10567097}, DOI = {10.1016/j.addma.2024.104220}, abstractNote = {}, journal = {Additive Manufacturing}, volume = {86}, number = {C}, publisher = {Elsevier}, author = {Sikulskyi, Stanislav and Srinivasaraghavan_Govindarajan, Rishikesh and Stark, Taylor and Ren, Zefu and Reed, Nicholas and Kim, Daewon}, }