Yu, Andrew_C, Srimani, Tathagata, and Shulaker, Max_M. Overcoming Ambient Drift and Negative-Bias Temperature Instability in Foundry Carbon Nanotube Transistors. ACS Applied Materials & Interfaces 17.13 Web. doi:10.1021/acsami.4c22130.

Yu, Andrew_C, Srimani, Tathagata, & Shulaker, Max_M. Overcoming Ambient Drift and Negative-Bias Temperature Instability in Foundry Carbon Nanotube Transistors. ACS Applied Materials & Interfaces, 17 (13). https://doi.org/10.1021/acsami.4c22130

Yu, Andrew_C, Srimani, Tathagata, and Shulaker, Max_M. "Overcoming Ambient Drift and Negative-Bias Temperature Instability in Foundry Carbon Nanotube Transistors". ACS Applied Materials & Interfaces 17 (13). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsami.4c22130. https://par.nsf.gov/biblio/10578012.

@article{osti_10578012,
place = {Country unknown/Code not available}, title = {Overcoming Ambient Drift and Negative-Bias Temperature Instability in Foundry Carbon Nanotube Transistors}, url = {https://par.nsf.gov/biblio/10578012}, DOI = {10.1021/acsami.4c22130}, abstractNote = {Not Available}, journal = {ACS Applied Materials & Interfaces}, volume = {17}, number = {13}, publisher = {American Chemical Society}, author = {Yu, Andrew_C and Srimani, Tathagata and Shulaker, Max_M}, }