Kim, Juhee, Xin, Xiaoyue, Kann, Ryan_J, Li, Jiaqi, Labrozzi, Aidan_S, Xu, Jiale, and Huang, Ching-Hua. Photodegradation of Nitrogenous Disinfection Byproducts by Far-UVC Light at 222 nm. ACS ES&T Water 5.5 Web. doi:10.1021/acsestwater.5c00156.

Kim, Juhee, Xin, Xiaoyue, Kann, Ryan_J, Li, Jiaqi, Labrozzi, Aidan_S, Xu, Jiale, & Huang, Ching-Hua. Photodegradation of Nitrogenous Disinfection Byproducts by Far-UVC Light at 222 nm. ACS ES&T Water, 5 (5). https://doi.org/10.1021/acsestwater.5c00156

Kim, Juhee, Xin, Xiaoyue, Kann, Ryan_J, Li, Jiaqi, Labrozzi, Aidan_S, Xu, Jiale, and Huang, Ching-Hua. "Photodegradation of Nitrogenous Disinfection Byproducts by Far-UVC Light at 222 nm". ACS ES&T Water 5 (5). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsestwater.5c00156. https://par.nsf.gov/biblio/10582185.

@article{osti_10582185,
place = {Country unknown/Code not available}, title = {Photodegradation of Nitrogenous Disinfection Byproducts by Far-UVC Light at 222 nm}, url = {https://par.nsf.gov/biblio/10582185}, DOI = {10.1021/acsestwater.5c00156}, abstractNote = {Not Available}, journal = {ACS ES&T Water}, volume = {5}, number = {5}, publisher = {American Chemical Society}, author = {Kim, Juhee and Xin, Xiaoyue and Kann, Ryan_J and Li, Jiaqi and Labrozzi, Aidan_S and Xu, Jiale and Huang, Ching-Hua}, }