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Ultrawide bandgap β-(AlxGa1−x)2O3 vertical Schottky barrier diodes on (010) β-Ga2O3 substrates are demonstrated. The β-(AlxGa1−x)2O3 epilayer has an Al composition of 21% and a nominal Si doping of 2 × 1017 cm−3 grown by molecular beam epitaxy. Pt/Ti/Au has been employed as the top Schottky contact, whereas Ti/Au has been utilized as the bottom Ohmic contact. The fabricated devices show excellent rectification with a high on/off ratio of ∼109, a turn-on voltage of 1.5 V, and an on-resistance of 3.4 mΩ cm2. Temperature-dependent forward current-voltage characteristics show effective Schottky barrier height varied from 0.91 to 1.18 eV while the ideality factor from 1.8 to 1.1 with increasing temperatures, which is ascribed to the inhomogeneity of the metal/semiconductor interface. The Schottky barrier height was considered a Gaussian distribution of potential, where the extracted mean barrier height and a standard deviation at zero bias were 1.81 and 0.18 eV, respectively. A comprehensive analysis of the device leakage was performed to identify possible leakage mechanisms by studying temperature-dependent reverse current-voltage characteristics. At reverse bias, due to the large Schottky barrier height, the contributions from thermionic emission and thermionic field emission are negligible. By fitting reverse leakage currents at different temperatures, it was identified that Poole–Frenkel emission and trap-assisted tunneling are the main leakage mechanisms at high- and low-temperature regimes, respectively. Electrons can tunnel through the Schottky barrier assisted by traps at low temperatures, while they can escape these traps at high temperatures and be transported under high electric fields. This work can serve as an important reference for the future development of ultrawide bandgap β-(AlxGa1−x)2O3 power electronics, RF electronics, and ultraviolet photonics.
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Tunneling noise and defects in exfoliated hexagonal boron nitride
Hexagonal boron nitride (hBN) has become a mainstay as an insulating barrier in stackable nanoelectronics because of its large bandgap and chemical stability. At mono- and bilayer thicknesses, hBN can function as a tunnel barrier for electronic spectroscopy measurements. Noise spectroscopy is of particular interest, as noise can be a sensitive probe for electronic correlations not detectable by first-moment current measurements. In addition to the expected Johnson-Nyquist thermal noise and nonequilibrium shot noise, low frequency (<100 kHz) noise measurements in Au/hBN/Au tunneling structures as a function of temperature and bias reveal the presence of thermally excited dynamic defects, as manifested through a flicker noise contribution at high bias that freezes out as temperature is decreased. In contrast, broad-band high frequency (∼250MHz – 580MHz) measurements on the same device show shot noise with no flicker noise contribution. The presence of the flicker noise through multiple fabrication approaches and processing treatments suggests that the fluctuators are in the hBN layer itself. Device-to-device variation and the approximate 1/f dependence of the flicker noise constrain the fluctuator density to on the order of a few per square micron.
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- Award ID(s):
- 1704264
- PAR ID:
- 10597157
- Publisher / Repository:
- American Institute of Physics
- Date Published:
- Journal Name:
- AIP Advances
- Volume:
- 9
- Issue:
- 10
- ISSN:
- 2158-3226
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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