Stehle, Yijing_Y, Barnum, Timothy_J, Schujman, Sandra, Vlassiouk, Ivan_V, and Cortez, Rebecca. Plasma-Induced Tailoring of Graphene Oxide Surfaces for Electrochemical Applications: Functionalization and Etching. ACS Applied Electronic Materials 7.14 Web. doi:10.1021/acsaelm.5c00939.

Stehle, Yijing_Y, Barnum, Timothy_J, Schujman, Sandra, Vlassiouk, Ivan_V, & Cortez, Rebecca. Plasma-Induced Tailoring of Graphene Oxide Surfaces for Electrochemical Applications: Functionalization and Etching. ACS Applied Electronic Materials, 7 (14). https://doi.org/10.1021/acsaelm.5c00939

Stehle, Yijing_Y, Barnum, Timothy_J, Schujman, Sandra, Vlassiouk, Ivan_V, and Cortez, Rebecca. "Plasma-Induced Tailoring of Graphene Oxide Surfaces for Electrochemical Applications: Functionalization and Etching". ACS Applied Electronic Materials 7 (14). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsaelm.5c00939. https://par.nsf.gov/biblio/10610651.

@article{osti_10610651,
place = {Country unknown/Code not available}, title = {Plasma-Induced Tailoring of Graphene Oxide Surfaces for Electrochemical Applications: Functionalization and Etching}, url = {https://par.nsf.gov/biblio/10610651}, DOI = {10.1021/acsaelm.5c00939}, abstractNote = {Not Available}, journal = {ACS Applied Electronic Materials}, volume = {7}, number = {14}, publisher = {American Chemical Society}, author = {Stehle, Yijing_Y and Barnum, Timothy_J and Schujman, Sandra and Vlassiouk, Ivan_V and Cortez, Rebecca}, }