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			<titleStmt><title level='a'>Scalable Bottom-Up Synthesis of Nanoporous Hexagonal Boron Nitride ( &lt;i&gt;h&lt;/i&gt; -BN) for Large-Area Atomically Thin Ceramic Membranes</title></titleStmt>
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				<publisher>ACS Nano Letters</publisher>
				<date>02/26/2025</date>
			</publicationStmt>
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				<bibl> 
					<idno type="par_id">10611236</idno>
					<idno type="doi">10.1021/acs.nanolett.4c05939</idno>
					<title level='j'>Nano Letters</title>
<idno>1530-6984</idno>
<biblScope unit="volume">25</biblScope>
<biblScope unit="issue">8</biblScope>					

					<author>Andrew E Naclerio</author><author>Peifu Cheng</author><author>Saban M Hus</author><author>J Trey Diulus</author><author>Marti Checa</author><author>Ivan Vlassiouk</author><author>William H Fissell</author><author>Matthew Coupin</author><author>Jamie Warner</author><author>Liam Collins</author><author>Andrei Kolmakov</author><author>An-Ping Li</author><author>Piran R Kidambi</author>
				</bibl>
			</sourceDesc>
		</fileDesc>
		<profileDesc>
			<abstract><ab><![CDATA[Nanopores embedded within monolayer hexagonal boron nitride (h-BN) offer possibilities of creating atomically thin ceramic membranes with unique combinations of high permeance (atomic thinness), high selectivity (via molecular sieving), increased thermal stability, and superior chemical resistance. However, fabricating size-selective nanopores in monolayer h-BN via scalable top-down processes remains nontrivial due to its chemical inertness, and characterizing nanopore size distribution over a large area remains extremely challenging. Here, we demonstrate a facile and scalable approach of exploiting the chemical vapor deposition (CVD) process temperature to enable direct incorporation of subnanometer/nanoscale pores into the monolayer h-BN lattice, in combination with manufacturing compatible polymer casting to fabricate centimeter-scale nanoporous atomically thin ceramic membranes. We leverage diffusive transport of analytes including size-selective Ficoll sieving to characterize subnanometer-scale and nanoscale defects that manifest as pores in centimeter-scale h-BN membranes, overcoming previous limitations in large-area characterization of nanoscale defects in h-BN. Our approach opens a new frontier to advance atomically thin membranes to 2D ceramic materials, such as h-BN via facile and direct formation of nanopores, for size-selective separations.]]></ab></abstract>
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<div xmlns="http://www.tei-c.org/ns/1.0"><p>N anoporous atomically thin membranes offer trans- formative potential across a broad spectrum of applications including ionic/molecular separations, small molecule separation, dialysis, gas separation, proton exchange membranes, isotope separations, among others. <ref type="bibr">[1]</ref><ref type="bibr">[2]</ref><ref type="bibr">[3]</ref><ref type="bibr">[4]</ref><ref type="bibr">[5]</ref><ref type="bibr">[6]</ref><ref type="bibr">[7]</ref> Among the different atomically thin 2D materials, monolayer hexagonal boron nitride (h-BN) offers a unique combination of atomic thinness, exceptional chemical resistance, remarkable thermal stability, and most importantly, its capacity to support lattice defects that manifest as nanopores in an atomically thin membrane. <ref type="bibr">[8]</ref><ref type="bibr">[9]</ref><ref type="bibr">[10]</ref><ref type="bibr">[11]</ref><ref type="bibr">[12]</ref> These properties make monolayer h-BN ideally suited for fabricating atomically thin ceramic membranes with both high permeance (due to atomic thinness) and selectivity (via molecular sieving). <ref type="bibr">1,</ref><ref type="bibr">6</ref> h-BN membranes have been explored for applications including DNA translocation, proton exchange <ref type="bibr">4,</ref><ref type="bibr">[13]</ref><ref type="bibr">[14]</ref><ref type="bibr">[15]</ref><ref type="bibr">[16]</ref> and isotope separation <ref type="bibr">3,</ref><ref type="bibr">17</ref> as well as ionic <ref type="bibr">18,</ref><ref type="bibr">19</ref> and molecular separations.</p><p>However, introducing precise nanopores into monolayer h-BN presents significant challenges. Unlike graphene, where top-down etching techniques such as oxygen plasma and/or chemical etching readily introduce pores via a scalable process over large areas, the chemical inertness of h-BN limits pore formation to e-beam <ref type="bibr">20,</ref><ref type="bibr">21</ref> and ion irradiation <ref type="bibr">22</ref> that are often limited to small areas and low throughput or reactive ion etching techniques <ref type="bibr">23,</ref><ref type="bibr">24</ref> or XeF 2 etching, <ref type="bibr">25</ref> necessitating multiple process steps. Another challenge is the absence of a rapid and reliable method for characterizing defects in h-BN, preventing an effective feedback loop. For example, while graphene benefits from Raman spectroscopy as a reliable tool for defect analysis, equivalent techniques for h-BN currently remain elusive. <ref type="bibr">26,</ref><ref type="bibr">27</ref> Current methods for nanoscale h-BN defect characterization such as scanning tunnelling microscopy/spectroscopy (STM/S) and scanning transmission electron microscopy (STEM) are expensive, have low throughput, and are impractical for large-scale characterization limiting progress of nanoporous atomically thin h-BN membranes. <ref type="bibr">8,</ref><ref type="bibr">21,</ref><ref type="bibr">28,</ref><ref type="bibr">29</ref> We note that the ability to probe defects in the subnanometer to nanoscale range over large areas in monolayer h-BN is highly relevant to applications beyond atomically thin membranes, <ref type="bibr">[15]</ref><ref type="bibr">[16]</ref><ref type="bibr">[17]</ref><ref type="bibr">21,</ref><ref type="bibr">[30]</ref><ref type="bibr">[31]</ref><ref type="bibr">[32]</ref><ref type="bibr">[33]</ref><ref type="bibr">[34]</ref><ref type="bibr">[35]</ref> e.g., nanoelectronics, <ref type="bibr">[36]</ref><ref type="bibr">[37]</ref><ref type="bibr">[38]</ref><ref type="bibr">[39]</ref><ref type="bibr">[40]</ref><ref type="bibr">[41]</ref><ref type="bibr">[42]</ref><ref type="bibr">[43]</ref><ref type="bibr">[44]</ref><ref type="bibr">[45]</ref><ref type="bibr">[46]</ref> neutron detectors, <ref type="bibr">[47]</ref><ref type="bibr">[48]</ref><ref type="bibr">[49]</ref><ref type="bibr">[50]</ref><ref type="bibr">[51]</ref><ref type="bibr">[52]</ref><ref type="bibr">[53]</ref> photonics, <ref type="bibr">41,</ref><ref type="bibr">[54]</ref><ref type="bibr">[55]</ref><ref type="bibr">[56]</ref><ref type="bibr">[57]</ref><ref type="bibr">[58]</ref> oxidation protection, <ref type="bibr">59</ref> semiconductor processing, <ref type="bibr">60,</ref><ref type="bibr">61</ref> and others.</p><p>Here, we introduce a novel, scalable bottom-up approach to directly incorporate subnanometer-scale and nanoscale pores into monolayer h-BN during CVD by precisely tuning the synthesis temperature. While bottom-up synthesis of nanoporous monolayer graphene to fabricate atomically thin membranes exists, 7,62-72 they remain elusive for h-BN.</p><p>Additionally, we leverage a manufacturing-compatible process that integrates CVD-grown h-BN with poly ether sulfone (PES) through phase inversion, resulting in centimeter-scale h-BN+PES composite membranes. <ref type="bibr">63,</ref><ref type="bibr">73</ref> Further, we use diffusionbased transport experiments, <ref type="bibr">63,</ref><ref type="bibr">74,</ref><ref type="bibr">75</ref> including size-selective Ficoll sieving, <ref type="bibr">[76]</ref><ref type="bibr">[77]</ref><ref type="bibr">[78]</ref> to characterize nanopore size distribution over large membrane areas. Our results indicate that CVD growth conditions play a critical role; i.e., subnanometer pores are maximized at intermediate temperatures (&#8764;975 &#176;C). This controlled bottom-up nanopore formation, governed by the kinetics of the growth and etching processes, offers a pathway to enable atomically thin h-BN membranes. Finally, the h-BN Figure <ref type="figure">1</ref>. Bottom-up synthesis of monolayer h-BN. A) Hot-wall chemical vapor deposition (CVD) reactor setup using ammonia-borane as precursor for h-BN synthesis on polycrystalline Cu foil (also see Figure <ref type="figure">S6</ref>). B) Schematic of reactor and precursor chamber temperature profiles during CVD process. C) Exemplar optical image of unmerged monolayer triangular domains of h-BN on Cu foil after oxidization of the Cu foil by heating on a hot plate at &#8764;200 &#176;C. D) SEM image of complete h-BN film on Cu, identified via wrinkles in h-BN formed due to difference in thermal expansion between h-BN and the underlying Cu catalyst. Inset: STEM image of h-BN lattice (also see Figure <ref type="figure">S8</ref>). E) XPS spectra of h-BN on Cu with characteristic N 1s and B 1s spectra. F) AFM micrograph and line profile of edge of h-BN film transferred to 300 nm SiO 2 /Si wafer. The thickness of the film is observed to be &#8764;0.56 nm, consistent with monolayer h-BN. G) Raman spectrum of continuous h-BN film transferred to 300 nm SiO 2 /Si wafer shows the characteristic E 2g peak. H) UV-vis absorption spectra and the computed Tauc plot and calculated optical bandgap of &#8764;5.9 eV. <ref type="bibr">97,</ref><ref type="bibr">104</ref> All characterizations presented in Figure <ref type="figure">1</ref> are performed on h-BN grown for 90 min (for continous films and &#8764;22-25 min for unmerged domains) at 1025 &#176;C with 3.5 mg precursor at 85 &#176;C (see Supporting Information). membranes demonstrate separation factors as high as &#8764;97 for KCl (&#8764;0.66 nm) versus lysozyme (&#8764;3.8-4 nm) and &#8764;43 for Ltryptophan (&#8764;0.7-0.9 nm) versus lysozyme, alongside high permeance values (KCl &#8764;(2.1-7.4) &#215; 10 -6 m s -1 , L-Tr &#8764;(0.7-3.3) &#215; 10 -6 m s -1 , Lz &#8764;(3.6-20.9) &#215; 10 -8 m s -1 ) for model nanoscale separations. <ref type="bibr">79</ref> &#9632; BOTTOM-UP SYNTHESIS OF MONOLAYER H-BN</p></div>
<div xmlns="http://www.tei-c.org/ns/1.0"><head>VIA CVD</head><p>Atomically thin membrane applications necessitate large-area synthesis of 2D materials, and chemical vapor deposition (CVD) has emerged as the preferred route for scalable and cost-effective high-quality 2D material synthesis, <ref type="bibr">8,</ref><ref type="bibr">80</ref> including proof-of-concept demonstrations of manufacturing compatible roll-to-roll approaches. <ref type="bibr">[81]</ref><ref type="bibr">[82]</ref><ref type="bibr">[83]</ref><ref type="bibr">[84]</ref> However, 2D materials synthesized via CVD contain intrinsic lattice defects viewed as detrimental to electronic applications. <ref type="bibr">1,</ref><ref type="bibr">4,</ref><ref type="bibr">6,</ref><ref type="bibr">85</ref> For membrane applications, defects in the 2D lattice manifest as pores in an atomically thin membrane. Here, we demonstrate direct incorporation of nanopores into the atomically thin h-BN lattice during CVD via facile tuning of CVD growth temperature and enable the creation of nanoporous atomically thin ceramic membranes with size-selective transport without the need for postsynthesis top-down pore creation approaches that are challenging for ceramics/h-BN. Unlike graphene where Raman spectroscopy offers a measure of defects in the 2D lattice, <ref type="bibr">26</ref> no equivalent technique currently exists for probing defects in h-BN. Here, we use size-selective transport as a measure of defect sizes in monolayer h-BN over centimeter-scale areas by fabricating atomically thin membranes. <ref type="bibr">86</ref> We use a custom-built hot-wall reactor (Figure <ref type="figure">1A</ref> and Figure <ref type="figure">S6</ref>) with ammonia-borane precursor and H 2 gas to synthesize monolayer h-BN via CVD (Figure <ref type="figure">1B</ref>) on polycrystalline copper (Cu) foil catalysts (see methods). <ref type="bibr">8,</ref><ref type="bibr">80</ref> Ammonia-borane (precursor for B and N atoms <ref type="bibr">87,</ref><ref type="bibr">88</ref> ) is heated in a side chamber and the products are introduced into the reactor with H 2 as the carrier gas to the Cu foil catalyst. <ref type="bibr">87,</ref><ref type="bibr">88</ref> The Cu foil catalyzes monolayer h-BN via precursor dissociation, nucleation of h-BN domains (Figure <ref type="figure">1C</ref>), and subsequent growth of the domains to merge forming a polycrystalline film with increasing CVD growth time (Figure <ref type="figure">1D</ref>, Figure <ref type="figure">2A</ref>). The triangular shape of the nuclei is attributed to the higher stability of N terminated edges. <ref type="bibr">86,</ref><ref type="bibr">87</ref> The side chamber temperature (&#8764;70-90 &#176;C) allows for control over precursor delivery to the CVD reactor <ref type="bibr">87,</ref><ref type="bibr">88</ref> (Figure <ref type="figure">2</ref>) and the CVD reactor temperature (&#8764;875-1025 &#176;C) allows for control over film morphology (see Figure <ref type="figure">S1</ref>) and quality (Figures    3-5) as discussed further below. We only use h-BN grown at &gt;925 &#176;C for membrane fabrication (Figure <ref type="figure">3</ref>), since growth at 875 &#176;C results in an incomplete film (Figure <ref type="figure">S1</ref>).</p><p>h-BN nuclei on Cu foil appear as individual unmerged triangular domains that are readily visible via optical microscopy (Figure <ref type="figure">1C</ref>) after selective oxidization of the uncovered Cu foil surface by heating it on a hot plate in ambient environment. <ref type="bibr">[89]</ref><ref type="bibr">[90]</ref><ref type="bibr">[91]</ref><ref type="bibr">[92]</ref> SEM images further confirm the triangular h-BN nuclei (Figure <ref type="figure">2A</ref> images on the left column) on Cu foil as well as continuous h-BN films formed with increasing growth time (Figure <ref type="figure">1D</ref>, Figure <ref type="figure">2A</ref> images on the right column) and identified via with characteristic features such as wrinkles formed due to the difference in thermal expansion between h-BN and the underlying Cu catalyst upon cooling to ambient temperature. <ref type="bibr">93</ref> Additionally, secondary and ad-layers are also seen as smaller triangles along with wrinkles in the continuous h-BN films (Figures <ref type="figure">1D</ref> and <ref type="figure">2A</ref>, Figure <ref type="figure">S1</ref>).</p><p>SEM images (Figure <ref type="figure">2A</ref>) show h-BN surface coverage (Figure <ref type="figure">2B</ref>) increases with time for all side chamber temperatures (&#8764;70-90 &#176;C) indicating precursor delivery throughout the growth period. <ref type="bibr">87,</ref><ref type="bibr">88</ref> The side chamber temperature also influences the rate of h-BN growth on Cu (Figure <ref type="figure">2C</ref>); i.e., complete surface coverage (continuous film) is achieved within 30 min for side chamber temperatures &#8764;90 &#176;C, while temperature &#8764;70 &#176;C yields incomplete films even after 45 min (Figure <ref type="figure">2A</ref>). <ref type="bibr">87,</ref><ref type="bibr">88</ref> These observations indicate that the CVD process is in a kinetic regime limited by precursor supply. <ref type="bibr">80,</ref><ref type="bibr">[94]</ref><ref type="bibr">[95]</ref><ref type="bibr">[96]</ref><ref type="bibr">[97]</ref><ref type="bibr">[98]</ref> Finally, h-BN domain sizes (triangular edge length) measured just before full film coalescence (Figure <ref type="figure">2D</ref>) decrease from &#8764;17 to &#8764;13 &#956;m upon increasing side chamber temperature from 80 to 90 &#176;C (Figure <ref type="figure">2D</ref>), indicating higher nucleation density with increased precursor delivery at 90 &#176;C. <ref type="bibr">98</ref> X-ray photoelectron spectroscopy of the h-BN films on Cu shows characteristic peaks in the core level N 1s (&#8764;398.3 eV) and B 1s (&#8764;190.7 eV) spectra (Figure <ref type="figure">1E</ref>) with a B:N ratio &#8764;1 (Figure <ref type="figure">S2</ref>), confirming the elemental composition and stoichiometric balance of B and N atoms, respectively. <ref type="bibr">80,</ref><ref type="bibr">99</ref> Atomic force microscopy of an h-BN unmerged film transferred to 300 nm SiO 2 /Si wafer shows film thickness &#8764;0.56 nm, consistent with monolayer h-BN <ref type="bibr">93,</ref><ref type="bibr">100</ref> (Figure <ref type="figure">1F</ref>), and Raman spectra show the characteristic E 2g peak &#8764;1372 cm -1 for h-BN (Figure <ref type="figure">1G</ref>). <ref type="bibr">27,</ref><ref type="bibr">101</ref> Finally, the UV-vis absorption spectrum (Figure <ref type="figure">1H</ref>) shows a strong absorbance peak at &#8764;202 nm and the corresponding Tauc plot indicates an optical bandgap of &#8764;5.9 eV, also consistent with monolayer h-BN. <ref type="bibr">54,</ref><ref type="bibr">93,</ref><ref type="bibr">97,</ref><ref type="bibr">[102]</ref><ref type="bibr">[103]</ref><ref type="bibr">[104]</ref><ref type="bibr">[105]</ref> Finally, atomic resolution scanning tunneling microscopy (STM) and scanning transmission electron microscopy images (STEM) images show a hexagonal honeycomb mesh and further confirm the high crystallinity of the h-BN films (Figure <ref type="figure">4E</ref> and inset of Figure <ref type="figure">1D</ref>).</p></div>
<div xmlns="http://www.tei-c.org/ns/1.0"><head>&#9632; NANOPOROUS ATOMICALLY THIN h-BN</head></div>
<div xmlns="http://www.tei-c.org/ns/1.0"><head>MEMBRANE FABRICATION AND SIZE-SELECTIVE TRANSPORT</head><p>Having confirmed atomically thin h-BN films have been synthesized via CVD on Cu, we proceed to fabricate centimeter-scale nanoporous atomically thin ceramic membranes via facile and scalable polymer casting (Figure <ref type="figure">3A</ref>). <ref type="bibr">79,</ref><ref type="bibr">84</ref> A thin layer of polyether sulfone (PES) solution is cast onto h-BN on Cu and the resulting stack (PES|h-BN|Cu foil) is immersed immediately in a water bath to induce phase inversion of PES (Figure <ref type="figure">3A</ref>) converting it into porous supports for h-BN. <ref type="bibr">79,</ref><ref type="bibr">84</ref> Subsequent removal of the Cu foil via etching results in large-area h-BN transferred to porous PES supports, forming atomically thin ceramic membranes (see the optical image in Figure <ref type="figure">3B</ref>). SEM images (Figure <ref type="figure">3C&#65533;top</ref> view, Figure <ref type="figure">3D&#65533;cross</ref> section, and Figure <ref type="figure">S3</ref>) show 300-500 nm pores in the PES in the vicinity of h-BN effectively supporting the atomically thin monolayer and branch out to more finger-like structures further below, forming a hierarchical network of interconnected channels (Figure <ref type="figure">3C</ref>,D, Figure <ref type="figure">S3</ref>) within the &#8764;50 &#956;m thick PES supports (Figure <ref type="figure">S3A</ref>). <ref type="bibr">79,</ref><ref type="bibr">84</ref> The insulating nature of h-BN and PES presents challenges with SEM imaging due to charging, but adlayers are visible upon careful observation (Figure <ref type="figure">S3C</ref>,<ref type="figure">D</ref>), indicating the presence of the h-BN film on the PES supports (PES surface porosity &#8764;50%, Imagej analysis of SEM images).</p><p>Pressure driven transport of ethanol confirms h-BN is successfully transferred to PES supports and relatively free of large tears. <ref type="bibr">75,</ref><ref type="bibr">85</ref> Notably, compared to the control membrane, i.e., PES support (see methods), h-BN+PES effectively blocks &gt;99% of pressure-driven ethanol flow (Figure <ref type="figure">3E</ref>). Next, we proceed to measure and compare molecular diffusion through nanopores in h-BN to i) demonstrate molecular sieving though nanopores in h-BN membranes and ii) use diffusive transport to characterize nanopore sizes in h-BN as a function of synthesis temperature (Figure <ref type="figure">3F-I</ref>, Figure <ref type="figure">5</ref>).</p><p>Initially, we probe diffusive transport of single species using model analytes from subnanometer to nanometer length scales, i.e., KCl (hydrated diameter K + &#8764;0.66 nm, Cl -&#8764;0.66 nm), NaCl (hydrated diameter Na + &#8764;0.72 nm, Cl -&#8764;0.66 nm), Ltryptophan (L-Tr &#8764;0.7-0.9 nm), vitamin B12 (B12 &#8764;1-1.5 nm), and lysozyme (Lz &#8764;3.8-4 nm). <ref type="bibr">74,</ref><ref type="bibr">75,</ref><ref type="bibr">79,</ref><ref type="bibr">84</ref> Notably, the addition of h-BN significantly reduces the diffusive permeance of all species compared to PES controls without h-BN (Figure <ref type="figure">3F</ref>), indicating the observed transport resistance originates for monolayer h-BN. Further, the diffusive permeances though h-BN+PES and PES control membranes show a decreasing trend with increasing analyte size consistent with lower diffusivity for larger species (Figure <ref type="figure">3G</ref>). The effectiveness of the PES control membranes is observed via the selectivity (ratio of permeance) of the probed analytes being similar to i) polycarbonate track etched membranes with straight channel &#8764;200 nm pores that do not overlap and ii) ratio of diffusivity of analytes in free solution (Figure <ref type="figure">S4</ref>). <ref type="bibr">[106]</ref><ref type="bibr">[107]</ref><ref type="bibr">[108]</ref><ref type="bibr">[109]</ref><ref type="bibr">[110]</ref> To deconvolute transport from solution diffusivity, we use the permeance ratio of the h-BN+PES membrane to the PES control membranes, i.e., normalized flux (Figure <ref type="figure">3H</ref>). We observe a reduction in normalized flux with increasing analyte size for the h-BN membranes, indicating the presence of nanopores in the &#8764;0.66-4 nm size range (Figure <ref type="figure">3I</ref>); e.g., h-BN synthesized at 1025 &#176;C exhibits normalized flux of KCl &#8764;23.8%, NaCl &#8764;20.6%, L-Tr &#8764;18.2%, B12 &#8764;11.1% and Lz &#8764;4.3%. Interestingly, a reduction in CVD temperatures results in significantly higher normalized flux; e.g., h-BN synthesized at 975 &#176;C shows normalized flux of KCl &#8764;82.6%, NaCl &#8764;82.4%, L-Tr &#8764;81.1%, B12 &#8764;58.7% and Lz &#8764;9.1% (Figure <ref type="figure">3I</ref>), indicating facile incorporation of nanopores into the h-BN lattice via a reduction in CVD temperature. Further, the normalized flux of Lz consistently increases as the h-BN growth temperature decreases, i.e. Lz &#8764;4.3% (&#8764;1025 &#176;C), &#8764;7.9% (&#8764;1000 &#176;C), &#8764;9.1% (&#8764;975 &#176;C), &#8764;11% (&#8764;950 &#176;C), &#8764;25% (&#8764;925 &#176;C), respectively, indicating an increase in defects &gt;3.8-4 nm with lower h-BN growth temperatures. However, the permeance of smaller species do not particularly Nano Letters pubs.acs.org/NanoLett Letter follow this trend; e.g., h-BN grown at 975 &#176;C shows the highest normalized flux for KCl, NaCl, L-Tr, and B12 with higher and lower growth temperature decreasing the normalized flux. Finally, we note that the entire process from h-BN synthesis to membrane fabrication is reproducible across multiple samples (Figure <ref type="figure">S7</ref>). The difference in normalized flux of the different analytes can be used to aid visualization of the distribution of nanopore sizes in the atomically thin h-BN membrane (Figure <ref type="figure">3I</ref>). For example, the normalized flux associated with defect in the &#8764;0.66-1.5 nm size range can be obtained by subtracting the normalized flux of B12 (&#8764;1-1.5 nm) from the flux of KCl (&#8764;0.66 nm). Similarly, the difference between normalized flux of Lz (&#8764;3.8-4 nm) and B12 represents defects in the &#8764;1.5-4 nm size range (Figure <ref type="figure">3I</ref>). Hence, diffusive transport indicates the highest fraction of defects in the subnanometer size range for h-BN grown at &#8805;1000 &#176;C, the &#8764;1.5-4 nm range for h-BN grown at intermediate temperatures of &#8764;950 &#176;C and &#8764;975 &#176;C, and &#8805;3.8-4 nm for h-BN grown at &#8764;925 &#176;C. <ref type="bibr">79,</ref><ref type="bibr">80,</ref><ref type="bibr">111</ref> These observations of diffusive transport are further supported by atomic resolution STM and SEM images of the as-synthesized h-BN directly on Cu for different synthesis temperatures (Figure <ref type="figure">4</ref>, Figure <ref type="figure">S1</ref>) avoiding convolution from transfers processes that leave residues necessitating subsequent aggressive cleaning processes. <ref type="bibr">7,</ref><ref type="bibr">75,</ref><ref type="bibr">111</ref> Representative STM images of films grown at 1025 &#176;C shows the hexagonal h-BN lattice and a low density of subnanometer defects (Figure <ref type="figure">4</ref>). A significant increase in number and size of defects is observed upon reducing growth temperature to &#8764;975 &#176;C in agreement with transport measurements (Figure <ref type="figure">3</ref>). An analysis of the representative STM images (while acknowledging limitations of STM to small scan areas) indicates defect density &#8764;6.8 &#215; 10 12 cm -2 for 975 &#176;C and &#8764;2.4 &#215; 10 12 cm -2 for 1025 &#176;C, respectively.</p><p>For temperatures &#8804;925 &#176;C a distinct change in film morphology is seen (Figure <ref type="figure">4</ref> and Figure <ref type="figure">S1</ref>) compared to higher growth temperatures and STM imaging was nontrivial with an extremely rough surface. However, XPS indicates stochiometric balance of B:N &#8764; 1 is maintained for all synthesis temperatures &#8764;875-1025 &#176;C (Figure <ref type="figure">S2</ref>). While the exact mechanisms of nanopores formation remain an active area of research, we hypothesize it results from the complex interplay of several synergistic as well as competing h-BN growth steps including precursor dissociation on the Cu surface to form active species, diffusion of active species on the Cu surface, reaction rate to form the h-BN film, incorporation of elemental species into the Cu bulk and solubility, desorption from the Cu surface, and H 2 etching during growth that can all change with CVD temperature. <ref type="bibr">80,</ref><ref type="bibr">87,</ref><ref type="bibr">97,</ref><ref type="bibr">[112]</ref><ref type="bibr">[113]</ref><ref type="bibr">[114]</ref> Notably, a reduction in CVD temperature could potentially change the rate-determining step in the h-BN growth process (due to differences in activation energies and frequency factors for each of the different reaction rates involved) allowing for formation of defects that manifest as nanopores. Taken together, a reduction in CVD growth temperature enables straightforward synthesis of nanoporous atomically thin h-BN. Remarkably, the h-BN + PES membranes fabricated using h-BN synthesized &#8764;975 &#176;C shows selectivity (ratio of permeance) for KCl/Lz &#8764;97 and L-Tr/Lz &#8764;43 (Figure <ref type="figure">S5</ref>). To the best of our knowledge, our experiments represent the first demonstration of fully functional centimeter-scale nanoporous atomically thin h-BN membranes for nanoscale separations.</p><p>While the single-analyte diffusion measurements allowed probing of defects in &#8764;0.66-4 nm size rage in centimeter-scale atomically thin h-BN membranes (Figure <ref type="figure">3</ref>), characterizing size distribution of defects over a wider size range and with a continuum of analyte sizes could enable advances in h-BN Nano Letters pubs.acs.org/NanoLett Letter <ref type="url">https://doi.org/10.1021/acs.nanolett.4c05939</ref> Nano Lett. XXXX, XXX, XXX-XXX F defect characterization for membrane as well as other applications.</p><p>Using diffusive transport of FITC-labeled Ficoll (branched polymer of sucrose and epichlorohydrin) as feed, we probe defects in the &#8764;2-24 nm size range (1-12 nm radius) via sizeexclusion chromatography of the permeate diffusing through the h-BN + PES membranes (Figure <ref type="figure">5A</ref>) fabricated using h-BN synthesized at different growth temperatures. <ref type="bibr">[76]</ref><ref type="bibr">[77]</ref><ref type="bibr">[78]</ref> Figure <ref type="figure">5B</ref> shows an increasing concentration of Ficoll over time from 1 to 7 days in the permeate with h-BN grown at high temperatures allowing for the least Ficoll transport throughout the size range, while decreasing the h-BN growth temperature results in more Ficoll transport (Figure <ref type="figure">5B-D</ref>), consistent with diffusive transport experiments (Figure <ref type="figure">3I</ref>). Notably, the size cutoff of 925 &#176;C h-BN+PES membranes is &#8764;7 nm analyte radius, whereas h-BN grown at 975 and 925 &#176;C exhbits a size cutoff &#8764;5 nm analyte radius (Figure <ref type="figure">5C</ref>,<ref type="figure">D</ref>). Finally, a comparison of Ficoll transport of similar size to Lz (&#8764;2 nm radius) with diffusive transport measurements of Lz (Figure <ref type="figure">3</ref>) shows good agreement. Taken together, our Ficoll experiments successfully characterize size distribution (ranges &#8764;2-24 nm) of nanopores/defects in centimeter-scale atomically thin h-BN membranes in a resource efficient manner that has previously remained elusive.</p><p>In summary, we demonstrate a facile and scalable method for fabricating centimeter-scale atomically thin ceramic membranes via bottom-up synthesis and polymer casting. A reduction in CVD temperature allows for direct incorporation of subnanometer-scale and nanoscale pores into the h-BN lattice during growth, alleviating the need for postsynthesis top-down pore creation approaches that remain challenging and increase costs and process complexity. Using a manufacturing compatible polymer casting and phase inversion approach to form porous PES supports for the nanoporous h-BN, we demonstrate centimeter-scale atomically thin ceramic membranes. We characterize the nanopores over large areas in atomically thin h-BN via diffusive-transport of analytes and size-selective Ficoll sieving to measure size distributions. The resulting h-BN membranes show selectivity of &#8764;97 for KCl/Lz and &#8764;43 for L-Tr/Lz, alongside significantly high permeance, and present potential for applications including protein desalting, dialysis, and small-molecule separations. Our work provides foundational approaches to enable atomically thin ceramic membranes, unlocking the potential of materials like h-BN for nanoscale separations including in potentially harsh </p></div><note xmlns="http://www.tei-c.org/ns/1.0" place="foot" xml:id="foot_0"><p>https://doi.org/10.1021/acs.nanolett.4c05939 Nano Lett. XXXX, XXX, XXX-XXX E</p></note>
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