Hasan, Shaheen, Kenath, Gopal S, Goswami, Mrigaraj, Luo, Xuan, Yuan, Liming, Huang, Jason, Lou, Yang, Karanastasis, Apostolos, Vijayamohanan, Harikrishnan, Palermo, Edmund F, Han, Kyu_Young, and Ullal, Chaitanya K. Volumetric Patterning of Gels via Super Resolved Interference Lithography. Retrieved from https://par.nsf.gov/biblio/10624049. ACS Applied Materials & Interfaces 17.30 Web. doi:10.1021/acsami.5c06729.

Hasan, Shaheen, Kenath, Gopal S, Goswami, Mrigaraj, Luo, Xuan, Yuan, Liming, Huang, Jason, Lou, Yang, Karanastasis, Apostolos, Vijayamohanan, Harikrishnan, Palermo, Edmund F, Han, Kyu_Young, & Ullal, Chaitanya K. Volumetric Patterning of Gels via Super Resolved Interference Lithography. ACS Applied Materials & Interfaces, 17 (30). Retrieved from https://par.nsf.gov/biblio/10624049. https://doi.org/10.1021/acsami.5c06729

Hasan, Shaheen, Kenath, Gopal S, Goswami, Mrigaraj, Luo, Xuan, Yuan, Liming, Huang, Jason, Lou, Yang, Karanastasis, Apostolos, Vijayamohanan, Harikrishnan, Palermo, Edmund F, Han, Kyu_Young, and Ullal, Chaitanya K. "Volumetric Patterning of Gels via Super Resolved Interference Lithography". ACS Applied Materials & Interfaces 17 (30). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsami.5c06729. https://par.nsf.gov/biblio/10624049.

@article{osti_10624049,
place = {Country unknown/Code not available}, title = {Volumetric Patterning of Gels via Super Resolved Interference Lithography}, url = {https://par.nsf.gov/biblio/10624049}, DOI = {10.1021/acsami.5c06729}, abstractNote = {}, journal = {ACS Applied Materials & Interfaces}, volume = {17}, number = {30}, publisher = {American Chemical Society}, author = {Hasan, Shaheen and Kenath, Gopal S and Goswami, Mrigaraj and Luo, Xuan and Yuan, Liming and Huang, Jason and Lou, Yang and Karanastasis, Apostolos and Vijayamohanan, Harikrishnan and Palermo, Edmund F and Han, Kyu_Young and Ullal, Chaitanya K}, }