Jha, Meghna, Mogollon_Santiana, Joaquin, Hong, Megan L, Vong, Emily, Ahmadi, Shiva, Manikantan, Harishankar, and Moulé, Adam J. Advancing Semiconducting Polymer Patterning: Analysis and Predictive Modeling of Micropatterns Achieved via Photothermal Lithography. Retrieved from https://par.nsf.gov/biblio/10629646. ACS Applied Polymer Materials 6.18 Web. doi:10.1021/acsapm.4c01884.

Jha, Meghna, Mogollon_Santiana, Joaquin, Hong, Megan L, Vong, Emily, Ahmadi, Shiva, Manikantan, Harishankar, & Moulé, Adam J. Advancing Semiconducting Polymer Patterning: Analysis and Predictive Modeling of Micropatterns Achieved via Photothermal Lithography. ACS Applied Polymer Materials, 6 (18). Retrieved from https://par.nsf.gov/biblio/10629646. https://doi.org/10.1021/acsapm.4c01884

Jha, Meghna, Mogollon_Santiana, Joaquin, Hong, Megan L, Vong, Emily, Ahmadi, Shiva, Manikantan, Harishankar, and Moulé, Adam J. "Advancing Semiconducting Polymer Patterning: Analysis and Predictive Modeling of Micropatterns Achieved via Photothermal Lithography". ACS Applied Polymer Materials 6 (18). Country unknown/Code not available: American Chemical Society. https://doi.org/10.1021/acsapm.4c01884. https://par.nsf.gov/biblio/10629646.

@article{osti_10629646,
place = {Country unknown/Code not available}, title = {Advancing Semiconducting Polymer Patterning: Analysis and Predictive Modeling of Micropatterns Achieved via Photothermal Lithography}, url = {https://par.nsf.gov/biblio/10629646}, DOI = {10.1021/acsapm.4c01884}, abstractNote = {}, journal = {ACS Applied Polymer Materials}, volume = {6}, number = {18}, publisher = {American Chemical Society}, author = {Jha, Meghna and Mogollon_Santiana, Joaquin and Hong, Megan L and Vong, Emily and Ahmadi, Shiva and Manikantan, Harishankar and Moulé, Adam J}, }