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Abstract The effects on the C−I⋅⋅N halogen bond between iodobenzene and NH3of placing various substituents on the phenyl ring are monitored by quantum calculations. Substituents R=N(CH3)2, NH2, CH3, OCH3, COCH3, Cl, F, COH, CN, and NO2were each placed ortho, meta, and para to the I. The depth of the σ‐hole on I is deepened as R becomes more electron‐withdrawing which is reflected in a strengthening of the halogen bond, which varied between 3.3 and 5.5 kcal mol−1. In most cases, the ortho placement yields the largest perturbation, followed by meta and then para, but this trend is not universal. Parallel to these substituent effects is a progressive lengthening of the covalent C−I bond. Formation of the halogen bond reduces the NMR chemical shielding of all three nuclei directly involved in the C−I⋅⋅N interaction. The deshielding of the electron donor N is most closely correlated with the strength of the bond, as is the coupling constant between I and N, so both have potential use as spectroscopic measures of halogen bond strength.
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Illuminating the Performance of Electron Withdrawing Groups in Halogen Bonding
Abstract Throughout the halogen bonding literature, electron withdrawing groups are relied upon heavily for tuning the interaction strength between the halogen bond donor and acceptor; however, the interplay of electronic effects associated with various substituents is less of a focus. This work utilizes computational techniques to study the degree ofσ‐ andπ‐electron donating/accepting character of electron withdrawing groups in a prescribed set of halo‐alkyne, halo‐benzene, and halo‐ethynyl benzene halogen bond donors. We examine how these factors affect theσ‐hole magnitude of the donors as well as the binding strength of the corresponding complexes with an ammonia acceptor. Statistical analyses aid the interpretation of how these substituents influence the properties of the halogen bond donors and complexes, and show that the electron withdrawing groups that are bothσ‐ andπ‐electron accepting form the strongest halogen bond complexes.
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- Award ID(s):
- 2147956
- PAR ID:
- 10642615
- Publisher / Repository:
- Wiley Blackwell (John Wiley & Sons)
- Date Published:
- Journal Name:
- ChemPhysChem
- Volume:
- 25
- Issue:
- 24
- ISSN:
- 1439-4235
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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