Substitutionally doped transition metal dichalcogenides (TMDs) are essential for advancing TMD‐based field effect transistors, sensors, and quantum photonic devices. However, the impact of local dopant concentrations and dopant–dopant interactions on charge doping and defect formation within TMDs remains underexplored. Here, a breakthrough understanding of the influence of rhenium (Re) concentration is presented on charge doping and defect formation in MoS2monolayers grown by metal–organic chemical vapor deposition (MOCVD). It is shown that Re‐MoS2films exhibit reduced sulfur‐site defects, consistent with prior reports. However, as the Re concentration approaches ⪆2 atom%, significant clustering of Re in the MoS2is observed. Ab Initio calculations indicate that the transition from isolated Re atoms to Re clusters increases the ionization energy of Re dopants, thereby reducing Re‐doping efficacy. Using photoluminescence (PL) spectroscopy, it is shown that Re dopant clustering creates defect states that trap photogenerated excitons within the MoS2lattice, resulting in broad sub‐gap emission. These results provide critical insights into how the local concentration of metal dopants influences carrier density, defect formation, and exciton recombination in TMDs, offering a novel framework for designing future TMD‐based devices with improved electronic and photonic properties.
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Comparison of the MOCVD growth and properties of wafer-scale transition metal dichalcogenide epitaxial monolayers
Abstract Epitaxial growth of transition metal dichalcogenides (TMDs) by metalorganic chemical vapor deposition is a promising method for wafer-scale synthesis of monolayer films. This study focuses on a comparison of the epitaxial growth of MoS2, WS2, and WSe2monolayers on 2 inch c-plane sapphire substrates using a cold-wall reactor with metal hexacarbonyl and hydride chalcogen sources. Uniform thermofluidic conditions enabled a comparative analysis of nucleation density, domain size, and lateral growth rate across TMD compounds, shedding light on the impact of TMD chemistry on epitaxial growth. Despite the use of chemically analogous precursors such as Mo(CO)6or W(CO)6and H2S or H2Se, significant differences in growth behavior are observed. Comprehensive structural, optical, and transport characterizations provide insights into sulfur versus selenium-based TMDs, advancing the understanding of optimized growth conditions for these emerging materials.
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- Award ID(s):
- 2039351
- PAR ID:
- 10681229
- Author(s) / Creator(s):
- ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; ; more »
- Publisher / Repository:
- IOP Publishing
- Date Published:
- Journal Name:
- 2D Materials
- Volume:
- 12
- Issue:
- 4
- ISSN:
- 2053-1583
- Page Range / eLocation ID:
- 045009
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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