<?xml version="1.0" encoding="UTF-8"?><rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcq="http://purl.org/dc/terms/"><records count="1" morepages="false" start="1" end="1"><record rownumber="1"><dc:product_type>Journal Article</dc:product_type><dc:title>Understanding the Role of Ferroelastic Domains on the Pyroelectric and Electrocaloric Effects in Ferroelectric Thin Films</dc:title><dc:creator>Pandya, Shishir; Velarde, Gabriel A.; Gao, Ran; Everhardt, Arnoud S.; Wilbur, Joshua D.; Xu, Ruijuan; Maher, Josh T.; Agar, Joshua C.; Dames, Chris; Martin, Lane W.</dc:creator><dc:corporate_author/><dc:editor/><dc:description/><dc:publisher/><dc:date>2019-02-01</dc:date><dc:nsf_par_id>10089028</dc:nsf_par_id><dc:journal_name>Advanced Materials</dc:journal_name><dc:journal_volume>31</dc:journal_volume><dc:journal_issue>5</dc:journal_issue><dc:page_range_or_elocation>1803312</dc:page_range_or_elocation><dc:issn>0935-9648</dc:issn><dc:isbn/><dc:doi>https://doi.org/10.1002/adma.201803312</dc:doi><dcq:identifierAwardId>1708615</dcq:identifierAwardId><dc:subject/><dc:version_number/><dc:location/><dc:rights/><dc:institution/><dc:sponsoring_org>National Science Foundation</dc:sponsoring_org></record></records></rdf:RDF>