<?xml version="1.0" encoding="UTF-8"?><rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcq="http://purl.org/dc/terms/"><records count="1" morepages="false" start="1" end="1"><record rownumber="1"><dc:product_type>Journal Article</dc:product_type><dc:title>MnO(001) thin films on MgO(001) grown by reactive MBE using supersonic molecular beams</dc:title><dc:creator>Pedersen, Andrew J; Liu, Junchen; Li, Fanxing; Lamb, H Henry</dc:creator><dc:corporate_author/><dc:editor/><dc:description>&lt;p&gt;MnO(001) thin films were grown on commercial MgO(001) substrates at 520 °C by reactive molecular beam epitaxy (MBE) using Mn vapor and O2-seeded supersonic molecular beams (SMBs) both with and without radio frequency (RF) plasma excitation. For comparison, MnO(001) films were grown by reactive MBE using O2 from a leak valve. X-ray photoelectron spectroscopy confirmed the Mn2+ oxidation state and 10%–15% excess oxygen near the growth surface. Reflection high-energy electron diffraction and x-ray diffraction evidenced that the films were rock salt cubic MnO with very strong (001) orientation. High-angle annular dark field scanning transmission electron microscopy with energy-dispersive x-ray spectroscopy demonstrated abrupt MnO/MgO interfaces and indicated [(001)MnO||(001)MgO] epitaxial growth. Ex situ atomic force microscopy of films deposited without RF excitation revealed smooth growth surfaces. An SMB-grown MnO(001) film was converted to Mn3O4 with strong (110) orientation by post-growth exposure to an RF-discharge (RFD) SMB source providing O atoms; the surface of the resultant film contained elongated pits aligned with the MgO110 directions. In contrast, using the RFD-SMB source for growth resulted in MnO(001) films with elongated growth pits and square pyramidal hillocks aligned along the MgO110 and 100 directions, respectively.&lt;/p&gt;</dc:description><dc:publisher>AIP Publishing</dc:publisher><dc:date>2024-04-21</dc:date><dc:nsf_par_id>10531657</dc:nsf_par_id><dc:journal_name>The Journal of Chemical Physics</dc:journal_name><dc:journal_volume>160</dc:journal_volume><dc:journal_issue>15</dc:journal_issue><dc:page_range_or_elocation/><dc:issn>0021-9606</dc:issn><dc:isbn/><dc:doi>https://doi.org/10.1063/5.0198832</dc:doi><dcq:identifierAwardId>2116724</dcq:identifierAwardId><dc:subject/><dc:version_number/><dc:location/><dc:rights/><dc:institution/><dc:sponsoring_org>National Science Foundation</dc:sponsoring_org></record></records></rdf:RDF>