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High critical current (Ic) in high magnetic fields (B) with minimal variations with respect to the orientation of the B field is demanded by many applications such as high-field magnets for fusion systems. Motivated by this, this work studies 6 vol. % BaZrO3/YBa2Cu3O7 (BZO/YBCO) multilayer nanocomposite films by stacking two 10 nm thick Ca0.3Y0.7Ba2Cu3O7 (CaY-123) spacers with three BZO/YBCO layers of thickness varied from 50 to 330 nm to make the total film thickness of 150–1000 nm. The Ca diffusion from the spacers into BZO/YBCO was shown to dramatically enhance pinning efficiency of c-axis aligned BZO nanorods, which yields high and almost thickness independent critical current density (Jc) in the BZO/YBCO multilayer nanocomposite films. Remarkably, enhanced Jc was observed in these multilayer samples at a wide temperature range of 20–80 K and magnetic fields up to 9.0 T. In particular, the thicker BZO/YBCO multilayer films outperform their thinner counterparts in both higher value and less anisotropy of Jc at lower temperatures and higher fields. At 20 K and 9.0 T, Ic is up to 654 A/cm-width at B//c in the 6% multilayer (1000 nm) sample, which is close to 753 A/cm-width at B//ab due to the intrinsic pinning. This result illustrates the critical role of the Ca cation diffusion into the YBCO lattice in achieving high and isotropic pinning in thick BZO/YBCO multilayer films. 

Abstract Ultrathin (sub-2 nm) Al₂O₃/MgO memristors were recently developed using anin vacuoatomic layer deposition (ALD) process that minimizes unintended defects and prevents undesirable leakage current. These memristors provide a unique platform that allows oxygen vacancies (V_O) to be inserted into the memristor with atomic precision and study how this affects the formation and rupture of conductive filaments (CFs) during memristive switching. Herein, we present a systematic study on three sets of ultrathin Al₂O₃/MgO memristors with V_O-doping via modular MgO atomic layer insertion into an otherwise pristine insulating Al₂O₃atomic layer stack (ALS) using anin vacuoALD. At a fixed memristor thickness of 17 Al₂O₃/MgO atomic layers (∼1.9 nm), the properties of the memristors were found to be affected by the number and stacking pattern of the MgO atomic layers in the Al₂O₃/MgO ALS. Importantly, the trend of reduced low-state resistance and the increasing appearance of multi-step switches with an increasing number of MgO atomic layers suggests a direct correlation between the dimension and dynamic evolution of the conducting filaments and the V_Oconcentration and distribution. Understanding such a correlation is critical to an atomic-scale control of the switching behavior of ultrathin memristors.