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Creators/Authors contains: "Adamson, Marquix A."

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  1. null (Ed.)
  2. Abstract

    Self‐sustaining photocatalytic NO3reduction systems could become ideal NO3removal methods. Developing an efficient, highly active photocatalyst is the key to the photocatalytic reduction of NO3. In this work, we present the synthesis of Ni2P‐modified Ta3N5(Ni2P/Ta3N5), TaON (Ni2P/TaON), and TiO2(Ni2P/TiO2). Starting with a 2 mM (28 g/mL NO3−N) aqueous solution of NO3, as made Ni2P/Ta3N5and Ni2P/TaON display as high as 79% and 61% NO3conversion under 419 nm light within 12 h, which correspond to reaction rates per gram of 196 μmol g−1 h−1and 153 μmol g−1 h−1, respectively, and apparent quantum yields of 3–4%. Compared to 24% NO3conversion in Ni2P/TiO2, Ni2P/Ta3N5and Ni2P/TaON exhibit higher activities due to the visible light active semiconductor (SC) substrates Ta3N5and TaON. We also discuss two possible electron migration pathways in Ni2P/semiconductor heterostructures. Our experimental results suggest one dominant electron migration pathway in these materials, namely: Photo‐generated electrons migrate from the semiconductor to co‐catalyst Ni2P, and upshift its Fermi level. The higher Fermi level provides greater driving force and allows NO3reduction to occur on the Ni2P surface.

     
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