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Abstract The effect of proton implantation as isolation implant and subsequent annealing on the optical absorption and electrical resistivity of low-bandgapp-GaSb is reported. The measured transmittance spectra indicates that implantation creates a distribution of energy levels extending into the bandgap. Electrical measurements show that the average sheet resistance of the implanted layer increases only by an order of magnitude from its pre-implantation value at a proton dose of ∼1013cm−2followed by 200 °C annealing. It is also shown that annealing reduces the implantation-induced optical absorption while still retaining a high electrical resistivity.more » « less
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Pan, Wei; Burckel, D_Bruce; Spataru, Catalin_D; Sapkota, Keshab_R; Muhowski, Aaron_J; Hawkins, Samuel_D; Klem, John_F; Smith, Layla_S; Temple, Doyle_A; Enderson, Zachery_A; et al (, Nano Letters)
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