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Germanium alloyed with α-tin (GeSn) transitions to a direct bandgap semiconductor of significance for optoelectronics. It is essential to localize the carriers within the active region for improving the quantum efficiency in a GeSn based laser. In this work, epitaxial GeSn heterostructure material systems were analyzed to determine the band offsets for carrier confinement: (i) a 0.53% compressively strained Ge 0.97 Sn 0.03 /AlAs; (ii) a 0.81% compressively strained Ge 0.94 Sn 0.06 /Ge; and (iii) a lattice matched Ge 0.94 Sn 0.06 /In 0.12 Al 0.88 As. The phonon modes in GeSn alloys were studied using Raman spectroscopy as a function of Sn composition, that showed Sn induced red shifts in wavenumbers of the Ge–Ge longitudinal optical phonon mode peaks. The material parameter b representing strain contribution to Raman shifts of a Ge 0.94 Sn 0.06 alloy was determined as b = 314.81 ± 14 cm −1 . Low temperature photoluminescence measurements were performed at 79 K to determine direct and indirect energy bandgaps of E g,Γ = 0.72 eV and E g,L = 0.66 eV for 0.81% compressively strained Ge 0.94 Sn 0.06 , and E g,Γ = 0.73 eV and E g,L = 0.68 eV for lattice matched Ge 0.94 Sn 0.06 epilayers. Chemical effects of Sn atomic species were analyzed using X-ray photoelectron spectroscopy (XPS), revealing a shift in Ge 3d core level (CL) spectra towards the lower binding energy affecting the bonding environment. Large valence band offset of Δ E V = 0.91 ± 0.1 eV and conduction band offset of Δ E C,Γ–X = 0.64 ± 0.1 eV were determined from the Ge 0.94 Sn 0.06 /In 0.12 Al 0.88 As heterostructure using CL spectra by XPS measurements. The evaluated band offset was found to be of type-I configuration, needed for carrier confinement in a laser. In addition, these band offset values were compared with the first-principles-based calculated Ge/InAlAs band alignment, and it was found to have arsenic up-diffusion limited to 1 monolayer of epitaxial GeSn overlayer, ruling out the possibility of defects induced modification of band alignment. Furthermore, this lattice matched GeSn/InAlAs heterostructure band offset values were significantly higher than GeSn grown on group IV buffer/substrates. Therefore, a lattice matched GeSn/InAlAs material system has large band offsets offering superior carrier confinement to realize a highly efficient GeSn based photonic device. 

Band structure, strain, and polarization engineering of nitride heterostructures open unparalleled opportunities for quantum sensing in the infrared. Intersubband absorption and photoluminescence are employed to correlate structure with optical properties of nonpolar strain-balanced InGaN/AlGaN nanostructures grown by molecular-beam epitaxy. Mid-infrared intersubband transitions in m-plane (In)AlxGa1-xN/In0.16Ga0.84N (0.19x0.3) multi-quantum wells were observed for the first time in the range of 3.4-5.1 μm (244-360 meV). Direct and attenuated total-reflection infrared absorption measurements are interpreted using structural information revealed by high-resolution x-ray diffraction and transmission electron microanalysis. The experimental intersubband energies are better reproduced by calculations using the local-density approximation than the Hartree-Fock approximation for the exchange-correlation correction. The effect of charge density, quantum well width, and barrier alloy composition on the intersubband transition energy was examined to evaluate the potential of this material for practical infrared applications. Temperature-dependent continuous-wave and time-resolved photoluminescence (TRPL) measurements are also investigated to probe carrier localization and recombination in m-plane InGaN/AlGaN quantum wells. Average localization depths of 21 meV and 40 meV were estimated for the undoped and doped structures, respectively. Using TRPL, dual localization centers were identified in undoped structures, while a single type of localization centers was found in doped structures. At 2 K, a fast decay time of approximately 0.3ns was measured for both undoped and doped structures, while a longer decay time of 2.2 ns was found only for the undoped sample. TRPL in magnetic field was explored to examine the effect of doping sheets on carrier dynamics. 

Temperature-dependent continuous-excitation and time-resolved photoluminescence are studied to probe carrier localization and recombination in nearly strain-balanced m-plane In0.09Ga0.91N/Al0.19Ga0.81N multi-quantum wells grown by plasma-assisted molecular-beam epitaxy. An average localization depth of 21 meV is estimated for the undoped sample. This depth is much smaller than the reported values in polar structures and m-plane InGaN quantum wells. As part of this study, temperature and magnetic field dependence of time-resolved photoluminescence is performed. At 2 K, an initial fast decay time of 0.3 ns is measured for both undoped and doped structures. The undoped sample also exhibits a slow decay component with a time scale of 2.2 ns. The existence of two relaxation paths in the undoped structure can be attributed to different localization centers. The fast relaxation decays are relatively insensitive to external magnetic fields, while the slower relaxation time constant decreases significantly with increasing magnetic fields. The fast decay time scale in the undoped sample is likely due to indium fluctuations in the quantum well. The slow decay time may be related to carrier localization in the barriers. The addition of doping leads to a single fast decay time likely due to stronger exciton localization in the InGaN quantum wells. 

The optical activity of Raman scattering provides insight into the absolute configuration and conformation of chiral molecules. Applications of Raman optical activity (ROA) are limited by long integration times due to a relatively low sensitivity of the scattered light to chirality (typically 10^-3 to 10^-5). We apply ROA techniques to hyper-Raman scattering using incident circularly polarized light and a right-angle scattering geometry. We explore the sensitivity of hyper- Raman scattering to chirality as compared to spontaneous Raman optical activity. Using the excitation wavelength at around 532 nm, the photobleaching is minimized, while the hyper-Raman scattering benefits from the electronic resonant enhancement. For S/R-2-butanol and L/D-tartaric acid, we were unable to detect the hyper-Raman optical activity at the sensitivity level of 1%. We also explored parasitic thermal effects which can be mitigating by varying the repetition rate of the laser source used for excitation of hyper-Raman scattering. 

β-Ga2O3 is emerging as an interesting wide band gap semiconductor for solar blind photo detectors (SBPD) and high power field effect transistors (FET) because of its outstanding material properties including an extremely wide bandgap (Eg ~4.9eV) and a high breakdown field (8 MV/cm). This review summarizes recent trends and progress in the growth/doping of β-Ga2O3 thin films and then offers an overview of the state-of-the-art in SBPD and FET devices. The present challenges for β-Ga2O3 devices to penetrate the market in real-world applications are also considered, along with paths for future work.