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Fluorocarbon thin films are widely used in protective coatings due to their distinctive physical and chemical properties. However, their inherent lubricating nature often results in low scratch resistance and poor adhesion to substrates. In this study, a beam plasma source was employed to deposit fluorocarbon thin films, resulting in enhanced adhesion and scratch resistance while preserving optical transmittance and hydrophobicity. The beam plasma source can generate high-density plasma, resulting in the effective dissociation of the C4F8 source gas, as evidenced by the large ion current and high film deposition rates. A unique feature of this beam plasma source is that it can simultaneously emit a single broad beam of ions with independently controllable ion energy and flux to interact with the film. The fluorocarbon films exhibit high hydrophobicity with a contact angle of about 105°, a high optical transmittance of 85–90% in the visible wavelength range, and exceptional scratch resistance and durability.