Superlattices composed of either monoclinic μ-Fe2O3 or β-(AlxGa1−x)2O3 with β-Ga2O3 spacers are grown on (010) β-Ga2O3 substrates using plasma-assisted molecular beam epitaxy. High-resolution x-ray diffraction data are quantitatively fit using commercial dynamical x-ray diffraction software (LEPTOS) to obtain layer thicknesses, strain, and compositions. The strain state of β-(AlxGa1−x)2O3 and μ-Fe2O3 superlattices as characterized using reciprocal space maps in the symmetric (020) and asymmetric (420) diffraction conditions indicates coherent growths that are strained to the (010) β-Ga2O3 lattice. β-(AlxGa1−x)2O3 and μ-Fe2O3 superlattices grown at hotter substrate temperatures result in crystal structures with better coherency and reduced defects compared to colder growths. The growth rate of μ-Fe2O3 is ∼2.6 nm/min at Tsub = 700 °C and drops to ∼1.6 nm/min at Tsub = 800 °C due to increased Fe interdiffusion at hotter substrate temperatures. Scanning transmission electron microscopy data of a μ-Fe2O3 superlattice grown at Tsub = 700 °C confirm that there is significant diffusion of Fe atoms into β-Ga2O3 layers.
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The impact of 1.8 MeV proton irradiation on metalorganic chemical vapor deposition grown (010) β-Ga2O3 Schottky diodes is presented. It is found that after a 10.8×1013cm−2 proton fluence the Schottky barrier height of (1.40±0.05 eV) and the ideality factor of (1.05±0.05) are unaffected. Capacitance–voltage extracted net ionized doping curves indicate a carrier removal rate of 268±10cm−1. The defect states responsible for the observed carrier removal are studied through a combination of deep level transient and optical spectroscopies (DLTS/DLOS) as well as lighted capacitance–voltage (LCV) measurements. The dominating effect on the defect spectrum is due to the EC-2.0 eV defect state observed in DLOS and LCV. This state accounts for ∼75% of the total trap introduction rate and is the primary source of carrier removal from proton irradiation. Of the DLTS detected states, the EC-0.72 eV state dominated but had a comparably smaller contribution to the trap introduction. These two traps have previously been correlated with acceptor-like gallium vacancy-related defects. Several other trap states at EC-0.36, EC-0.63, and EC-1.09 eV were newly detected after proton irradiation, and two pre-existing states at EC-1.2 and EC-4.4 eV showed a slight increase in concentration after irradiation, together accounting for the remainder of trap introduction. However, a pre-existing trap at EC-0.40 eV was found to be insensitive to proton irradiation and, therefore, is likely of extrinsic origin. The comprehensive defect characterization of 1.8 MeV proton irradiation damage can aid the modeling and design for a range of radiation tolerant devices.
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A new record‐high room‐temperature electron Hall mobility (
μ RT = 194 cm2 V−1 s−1atn ≈ 8 × 1015 cm−3) for β‐Ga2O3is demonstrated in the unintentionally doped thin film grown on (010) semi‐insulating substrate via metal‐organic chemical vapor deposition (MOCVD). A peak electron mobility of ≈9500 cm2 V−1 s−1is achieved at 45 K. Further investigation on the transport properties indicates the existence of sheet charges near the epilayer/substrate interface. Si is identified as the primary contributor to the background carrier in both the epilayer and the interface, originating from both surface contamination and growth environment. The pregrowth hydrofluoric acid cleaning of the substrate leads to an obvious decrease in Si impurity both at the interface and in the epilayer. In addition, the effect of the MOCVD growth condition, particularly the chamber pressure, on the Si impurity incorporation is studied. A positive correlation between the background charge concentration and the MOCVD growth pressure is confirmed. It is noteworthy that in a β‐Ga2O3film with very low bulk charge concentration, even a reduced sheet charge density plays an important role in the charge transport properties.