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Microelectromechanical systems (MEMS) have emerged as highly attractive alternatives to conventional commercial off-the-shelf electronic sensors and systems due to their ability to offer miniature size, reduced weight, and low power consumption (i.e., SWaP advantages). These features make MEMS particularly appealing for a wide range of critical applications, including communication, biomedical, automotive, aerospace, and defense sectors. Resonant MEMS play crucial roles in these applications by providing precise timing references and channel selections for electronic devices, facilitating accurate filtering, mixing, synchronization, and tracking via their high stability and low phase noise. Additionally, they serve as key components in sensing applications, enabling detection and precise measurement of physical quantities for monitoring and control purposes across various fields. Temperature stability stands as a paramount performance specification for MEMS resonators and oscillators. It relates to the responsivity of a resonator's frequency to temperature variations and is typically quantified by the temperature coefficient of frequency (TCf). A constant and substantially large absolute TCf is preferred in MEMS temperature sensing applications, while a near-zero TCf is required for timing and other MEMS transducers that necessitate the decoupling of temperature effects on the resonance frequency. This comprehensive review aims to provide an in-depth overview of recent advancements in studying TCf in MEMS resonators. The review explores the compensation and engineering techniques employed across a range of resonator types, utilizing diverse materials. Various aspects are covered, including the design of MEMS resonators, theoretical analysis of TCf, temperature regulation techniques, and the metallization effect at high temperatures. The discussion encompasses TCf analysis of MEMS resonators operating in flexural, torsional, surface, and bulk modes, employing materials such as silicon (Si), lithium niobate (LiNbO3), silicon carbide (SiC), aluminum nitride (AlN), and gallium nitride (GaN). Furthermore, the review identifies areas that require continued development to fully exploit the TCf of MEMS resonators. 

As a viable alternative to the challenging fabrication of robust β-Ga2O3 p–n homojunctions, this study investigates the variable-temperature photocurrent of p-NiO/n-Ga2O3 heterojunction photodiodes under zero-bias conditions. The device's built-in electric field is utilized to achieve efficient separation of non-equilibrium photogenerated carriers. To support the experimental findings, computer simulations of the electric field distribution at the heterointerface were performed and correlated with experimental current–voltage and capacitance–voltage measurements. The photocurrent measurements confirm the narrowing of the n-Ga2O3 bandgap with increasing temperature, consistent with predictions from the Varshni equation. The observed decrease in photocurrent amplitude at lower temperatures is attributed to bandgap widening, which results in a smaller number of non-equilibrium carriers generated by the excitation wavelength. 

p-type Cr2MnO4 with bandgap 3.01 eV was sputter deposited onto (2¯01) and (001) n-type or semi-insulating β-Ga2O3.The heterojunction of p-type CrMnO4 on n-type Ga2O3 is found to be type II, staggered gap, i.e., the band offsets are such that both the conduction and valence band edges of Ga2O3 are lower in energy than those of the Cr2MnO4. This creates a staggered band alignment, which can facilitate the separation of photogenerated electron-hole pairs. The valence band edge of Cr2MnO4 is higher than that of Ga2O3 by 1.82–1.93 eV depending on substrate orientation and doping, which means that holes in Cr2MnO4 would have a lower energy barrier to overcome to move into Ga2O3. Conversely, the conduction band edge of Cr2MnO4 is higher than that of Ga2O3 by 0.13–0.30 eV depending on substrate doping and orientation, which would create a barrier for electrons in Ga2O3 to move into Cr2MnO4. This heterojunction looks highly promising for p-n junction formation for advanced Ga2O3-based power rectifiers. 

This study investigates minority electron diffusion length and carrier recombination phenomena in p-type 300 nm-thick Ga2O3 films homoepitaxially grown over a (001) tin-doped β-Ga2O3 conductive substrate. This research is novel due to its systematic and near-simultaneous measurements in the top layer of a p-Ga2O3/n-Ga2O3 structure using independent electron beam-induced current and cathodoluminescence techniques. Previous work primarily focused on heteroepitaxial architectures or gallium oxide grown over insulating substrates of the same material. In this work, the activation energies related to point defects in gallium oxide were extracted from temperature-dependent incremental electron beam irradiation experiments to gain insight into the defect landscape and its influence on minority carrier transport and recombination dynamics. 

Abstract Lateral Schottky or heterojunction rectifiers were irradiated with 10 MeV protons and neutrons. For proton irradiation, the forward current of both types of rectifiers decreased by approximately an order of magnitude, with a corresponding increase in on-state resistance. The resultant on/off ratio improved after irradiation because of the larger decrease in reverse current compared to forward current. Both types of rectifiers displayed a shift in forward current and RON curves to lower voltages after irradiation. This could be due to defects created by neutron irradiation introducing deep energy levels within the bandgap of AlN. These deep levels can trap charge carriers, reducing their mobility and increasing the on-state resistance. Transmission electron microscopy showed disorder created at the AlN/NiO interface by neutron irradiation. TCAD simulation was used to study the effects of irradiation with both protons and neutrons. The results confirmed that the irradiation caused a significant reduction in electron concentration and a small increase in the recombination rate. Neutron irradiation can also introduce interface states at the metal or oxide-semiconductor junction of the rectifier. These interface states can modify the effective Schottky barrier height, affecting the forward voltage drop and on-state resistance. 

Minority carrier diffusion length in undoped p-type gallium oxide was measured at various temperatures as a function of electron beam charge injection by electron beam-induced current technique in situ using a scanning electron microscope. The results demonstrate that charge injection into p-type β-gallium oxide leads to a significant linear increase in minority carrier diffusion length followed by its saturation. The effect was ascribed to trapping of non-equilibrium electrons (generated by a primary electron beam) on metastable native defect levels in the material, which in turn blocks recombination through these levels. While previous studies of the same material were focused on probing a non-equilibrium carrier recombination by purely optical means (cathodoluminescence), in this work, the impact of charge injection on minority carrier diffusion was investigated. The activation energy of ∼0.072 eV, obtained for the phenomenon of interest, is consistent with the involvement of Ga vacancy-related defects. 

Thermal annealing is commonly used in fabrication processing and/or performance enhancement of electronic and opto-electronic devices. In this study, we investigate an alternative approach, where high current density pulses are used instead of high temperature. The basic premise is that the electron wind force, resulting from the momentum loss of high-energy electrons at defect sites, is capable of mobilizing internal defects. The proposed technique is demonstrated on commercially available optoelectronic devices with two different initial conditions. The first study involved a thermally degraded edge-emitting laser diode. About 90% of the resulting increase in forward current was mitigated by the proposed annealing technique where very low duty cycle was used to suppress any temperature rise. The second study was more challenging, where a pristine vertical-cavity surface-emitting laser (VCSEL) was subjected to similar processing to see if the technique can enhance performance. Encouragingly, this treatment yielded a notable improvement of over 20% in the forward current. These findings underscore the potential of electropulsing as an efficient in-operando technique for damage recovery and performance enhancement in optoelectronic devices. 

Abstract Beta gallium oxide (β‐Ga₂O₃) has emerged as a highly promising semiconductor material with an ultrawide bandgap ranging from 4.5 to 4.9 eV for future applications in power electronics, optoelectronics, as well as gas and ultraviolet (UV) radiation sensors. Here, surface adsorption and air damping behavior of doubly clamped β‐Ga₂O₃nanomechanical resonators are probed and systemically studied by measuring the resonance characteristics under different gas and pressure conditions. High responsivities of resonance to pressure are obtained by heating the devices up to 300 °C to induce an accelerated adsorption–desorption process. The initial surface conditions of the β‐Ga₂O₃thin film play important roles in affecting the resonant behavior. UV ozone treatment proves effective in altering the initial surface conditions of β‐Ga₂O₃nanosheets by eliminating physisorbed contaminants and filling oxygen vacancy defects residing on the surface, resulting in a consequential and discernible modification of the resonance behavior of β‐Ga₂O₃nanomechanical resonators. The surface adsorption and desorption processes in β‐Ga₂O₃demonstrate clear reversibility by exposing the UV treated β‐Ga₂O₃to air. This study attains first‐hand information on how the surface conditions of β‐Ga₂O₃affect its mechanical properties, and helps guide future development of transducers via β‐Ga₂O₃nanoelectromechanical systems (NEMS) for pressure sensing applications, especially in harsh environments. 

β-Ga2O3 is an ultrawide bandgap semiconductor that is attracting much attention for applications in next-generation high-power, deep UV, and extreme-environment devices. Hydrogen impurities have been found to have a strong effect on the electrical properties of β-Ga2O3. This Tutorial is a survey of what has been learned about O–H centers in β-Ga2O3 from their vibrational properties. More than a dozen, O–H centers have been discovered by infrared absorption spectroscopy. Theory predicts defect structures with H trapped at split configurations of a Ga(1) vacancy that are consistent with the isotope and polarization dependence of the O–H vibrational spectra that have been measured by experiment. Furthermore, O–H centers in β-Ga2O3 have been found to evolve upon thermal annealing, giving defect reactions that modify conductivity. While much progress has been made toward understanding the microscopic properties and reactions of O–H centers in β-Ga2O3, many questions are discussed that remain unanswered. A goal of this Tutorial is to inspire future research that might solve these puzzles. 

Hydrogen in β-Ga2O3 passivates shallow impurities and deep-level defects and can have a strong effect on conductivity. More than a dozen O–D vibrational lines have been reported for β-Ga2O3 treated with the heavy isotope of hydrogen, deuterium. To explain the large number of O–D centers that have been observed, the involvement of additional nearby defects and impurities has been proposed. A few O–H centers have been associated with specific impurities that were introduced intentionally during crystal growth. However, definitive assignments of O–H and O–D vibrational lines associated with important adventitious impurities, such as Si and Fe, have been difficult. A set of well-characterized Si-doped β-Ga2O3 epitaxial layers with different layer thicknesses has been deuterated and investigated by vibrational spectroscopy to provide new evidence for the assignment of a line at 2577 cm−1 to an OD–Si complex. The vibrational properties of several of the reported OD-impurity complexes are consistent with the existence of a family of defects with a VGa1ic−D center at their core that is perturbed by a nearby impurity.