skip to main content

Search for: All records

Creators/Authors contains: "Tanner, David J."

Note: When clicking on a Digital Object Identifier (DOI) number, you will be taken to an external site maintained by the publisher. Some full text articles may not yet be available without a charge during the embargo (administrative interval).
What is a DOI Number?

Some links on this page may take you to non-federal websites. Their policies may differ from this site.

  1. Abstract. Glyoxal (CHOCHO), the simplest dicarbonyl in thetroposphere, is a potential precursor for secondary organic aerosol (SOA)and brown carbon (BrC) affecting air quality and climate. The airbornemeasurement of CHOCHO concentrations during the KORUS-AQ (KORea–US AirQuality study) campaign in 2016 enables detailed quantification of lossmechanisms pertaining to SOA formation in the real atmosphere. Theproduction of this molecule was mainly from oxidation of aromatics (59 %)initiated by hydroxyl radical (OH). CHOCHO loss to aerosol was found to bethe most important removal path (69 %) and contributed to roughly∼ 20 % (3.7 µg sm−3 ppmv−1 h−1,normalized with excess CO) of SOA growth in the first 6 h in SeoulMetropolitan Area. A reactive uptake coefficient (γ) of∼ 0.008 best represents the loss of CHOCHO by surface uptakeduring the campaign. To our knowledge, we show the first field observationof aerosol surface-area-dependent (Asurf) CHOCHO uptake, which divergesfrom the simple surface uptake assumption as Asurf increases in ambientcondition. Specifically, under the low (high) aerosol loading, the CHOCHOeffective uptake rate coefficient, keff,uptake, linearly increases(levels off) with Asurf; thus, the irreversible surface uptake is areasonable (unreasonable) approximation for simulating CHOCHO loss toaerosol. Dependence on photochemical impact and changes in the chemical andphysical aerosol properties “free water”, as well as aerosol viscosity,are discussed as other possible factors influencing CHOCHO uptakemore »rate. Ourinferred Henry's law coefficient of CHOCHO, 7.0×108 M atm−1, is ∼ 2 orders of magnitude higher than thoseestimated from salting-in effects constrained by inorganic salts onlyconsistent with laboratory findings that show similar high partitioning intowater-soluble organics, which urges more understanding on CHOCHO solubilityunder real atmospheric conditions.« less
    Free, publicly-accessible full text available January 1, 2023
  2. Abstract. A new ion source (IS) utilizing vacuum ultraviolet (VUV) light is developed and characterized for use with iodide–chemical ionization massspectrometers (I−-CIMS). The VUV-IS utilizes a compact krypton lamp that emits light at two wavelengths corresponding to energies of∼10.030 and 10.641 eV. The VUV light photoionizes either methyl iodide (ionization potential, IP = 9.54 ± 0.02 eV)or benzene (IP = 9.24378 ± 0.00007 eV) to form cations and photoelectrons. The electrons react with methyl iodide to formI−, which serves as the reagent ion for the CIMS. The VUV-IS is characterized by measuring the sensitivity of a quadrupole CIMS (Q-CIMS) toformic acid, molecular chlorine, and nitryl chloride under a variety of flow and pressure conditions. The sensitivity of the Q-CIMS, with theVUV-IS, reached up to ∼700 Hz pptv−1, with detection limits of less than 1 pptv for a 1 min integration period. Thereliability of the Q-CIMS with a VUV-IS is demonstrated with data from a month-long ground-based field campaign. The VUV-IS is further tested byoperation on a high-resolution time-of-flight CIMS (TOF-CIMS). Sensitivities greater than 25 Hz pptv−1 were obtained for formic acid andmolecular chlorine, which were similar to that obtained with a radioactive source. In addition, the mass spectra from sampling ambient air wascleaner with the VUV-IS on the TOF-CIMS compared to measurements using a radioactive source. These results demonstrate that the VUV lamp is a viablesubstitute for radioactivemore »ion sources on I−-CIMS systems for most applications. In addition, initial tests demonstrate that the VUV-IS canbe extended to other reagent ions by the use of VUV absorbers with low IPs to serve as a source of photoelectrons for high IP electron attachers,such as SF6-.« less