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Abstract Silver nanoparticles (NPs) are extensively used in electronic components, chemical sensors, and disinfection applications, in which many of their properties depend on particle size. However, control over silver NP size and morphology still remains a challenge for many synthesis techniques. In this work, we demonstrate the surfactant-free synthesis of silver NPs using a low-pressure inductively coupled nonthermal argon plasma. Continuously forming droplets of silver nitrate (AgNO 3 ) precursor dissolved in glycerol are exposed to the plasma, with the droplet residence time being determined by the precursor flow rate. Glycerol has rarely been studied in plasma-liquid interactions but shows favorable properties for controlled NP synthesis at low pressure. We show that the droplet residence time and plasma power have strong influence on NP properties, and that improved size control and particle monodispersity can be achieved by pulsed power operation. Silver NPs had mean diameters of 20 nm with geometric standard deviations of 1.6 under continuous wave operation, which decreased to 6 nm mean and 1.3 geometric standard deviation for pulsed power operation at 100 Hz and 20% duty cycle. We propose that solvated electrons from the plasma and vacuum ultraviolet (VUV) radiation induced electrons produced in glycerol are the main reducing agents of Ag + , the precursor for NPs, while no significant change of chemical composition of the glycerol solvent was detected. 

Hydrogenated amorphous silicon (a-Si:H) has drawn keen interest as a thin-film semiconductor and superb passivation layer in high-efficiency silicon solar cells due to its low cost, low processing temperature, high compatibility with substrates, and scalable manufacturing. Although the impact of hydrogenation on the structural, optical, and electronic properties of a-Si:H has been extensively studied, the underlying physics of its impact on the thermal properties is still unclear. Here, we synthesize a-Si:H films with well-controlled hydrogen concentrations using plasma-enhanced chemical vapor deposition and systematically study the thermal conductivity of these a-Si:H films using time-domain thermoreflectance. We find that the reduction of thermal conductivity of a-Si:H films is attributed to the suppression of diffuson and propagon contributions as the hydrogen concentration increases. At the maximum hydrogen concentration of 25.4 atomic percentage, the contributions from diffusons and propagons to the thermal conductivity are decreased by 40% (from 1.10 to 0.67 W m −1 K −1 ) and 64% (from 0.61 to 0.22 W m −1 K −1 ), respectively. Such a significant reduction in the thermal conductivity of a-Si:H originates from the hydrogen induced material softening, the decrease in density, and phonon-defect scattering. The results of this work provide fundamental insights into the thermal transport properties of a-Si:H thin films, which is beneficial for the design and optimization of amorphous silicon-based technologies including photovoltaics, large-area electronics, and thermoelectric devices. 

Abstract Low-pressure nonthermal flowing plasmas are widely used for the gas-phase synthesis of nanoparticles and quantum dots of materials that are difficult or impractical to synthesize using other techniques. To date, the impact of temporary electrostatic particle trapping in these plasmas has not been recognized, a process that may be leveraged to control particle properties. Here, we present experimental and computational evidence that, during their growth in the plasma, sub-10 nm silicon particles become temporarily confined in an electrostatic trap in radio-frequency excited plasmas until they grow to a size at which the increasing drag force imparted by the flowing gas entrains the particles, carrying them out of the trap. We demonstrate that this trapping enables the size filtering of the synthesized particles, leading to highly monodisperse particle sizes, as well as the electrostatic focusing of the particles onto the reactor centerline. Understanding of the mechanisms and utilization of such particle trapping will enable the design of plasma processes with improved size control and the ability to grow heterostructured nanoparticles.