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  1. Free, publicly-accessible full text available August 1, 2024
  2. Free, publicly-accessible full text available May 28, 2024
  3. Abstract Benefitted from progress on the large-diameter Ga 2 O 3 wafers and Ga 2 O 3 processing techniques, the Ga 2 O 3 power device technology has witnessed fast advances toward power electronics applications. Recently, reports on large-area (ampere-class) Ga 2 O 3 power devices have emerged globally, and the scope of these works have gone well beyond the bare-die device demonstration into the device packaging, circuit testing, and ruggedness evaluation. These results have placed Ga 2 O 3 in a unique position as the only ultra-wide bandgap semiconductor reaching these indispensable milestones for power device development. This paper presents a timely review on the state-of-the-art of the ampere-class Ga 2 O 3 power devices (current up to >100 A and voltage up to >2000 V), including their static electrical performance, switching characteristics, packaging and thermal management, and the overcurrent/overvoltage ruggedness and reliability. Exciting research opportunities and critical technological gaps are also discussed. 
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  4. Edge termination is the enabling building block of power devices to exploit the high breakdown field of wide bandgap (WBG) and ultra-wide bandgap (UWBG) semiconductors. This work presents a heterogeneous junction termination extension (JTE) based on p-type nickel oxide (NiO) for gallium oxide (Ga2O3) devices. Distinct from prior JTEs usually made by implantation or etch, this NiO JTE is deposited on the surface of Ga2O3 by magnetron sputtering. The JTE consists of multiple NiO layers with various lengths to allow for a graded decrease in effective charge density away from the device active region. Moreover, this surface JTE has broad design window and process latitude, and its efficiency is drift-layer agnostic. The physics of this NiO JTE is validated by experimental applications into NiO/Ga2O3 p–n diodes fabricated on two Ga2O3 wafers with different doping concentrations. The JTE enables a breakdown voltage over 3.2 kV and a consistent parallel-plate junction field of 4.2 MV/cm in both devices, rendering a power figure of merit of 2.5–2.7 GW/cm2. These results show the great promise of the deposited JTE as a flexible, near ideal edge termination for WBG and UWBG devices, particularly those lacking high-quality homojunctions. 
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    Free, publicly-accessible full text available May 1, 2024