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A ML Framework for Genetic Sequence Identification Using 2D Electrical Conductance Probability Distributions from Mixed Data Sets

https://doi.org/10.1109/TCBBIO.2025.3536282

Wang, Yiren; Wang, Hongning; Das, Arindam K; Anantram, M P (March 2025, IEEE Transactions on Computational Biology and Bioinformatics)

Free, publicly-accessible full text available March 1, 2026
Conformation driven conductance modulation in single-stranded RNA (ssRNA)

https://doi.org/10.1039/d5nh00241a

De, Arpan; Das, Arindam K; Anantram, M P (January 2025, Nanoscale Horizons)

This article explores how conformational fluctuations influence the conductance of a single-stranded RNA (ssRNA) and the means to harness its inherent structural variabilityviasalt concentration regulation.
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Advancing Semiconductor Manufacturing through DNA- Templated Lithography and Molecular-Scale Patterning of 2D Materials

https://doi.org/10.1109/WMED61554.2024.10534135

Kumari, Anumita; Curtis, Michael; De, Arpan; Liu, Haitao; Estrada, David; Anantram, MP (March 2024, IEEE)

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Advancing Semiconductor Manufacturing through DNA-Templated Lithography and Molecular-Scale Patterning of 2D Materials

Anumita Kumari, Michael Curtis (March 2024, IEEE)

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DNA-based doping and fabrication of PN diodes

https://doi.org/10.3389/fnano.2024.1291328

Bai, Ruobing; Liu, Yihan; Zhang, Bomin; Chen, Beishan; Xiong, Feng; Liu, Haitao (February 2024, Frontiers in Nanotechnology)

This paper reports the fabrication of silicon PN diode by using DNA nanostructure as the etching template for SiO₂and also as then-dopant of Si. DNA nanotubes were deposited ontop-type silicon wafer that has a thermal SiO₂layer. The DNA nanotubes catalyze the etching of SiO₂by HF vapor to expose the underlying Si. The phosphate groups in the DNA nanotube were used as the doping source to locallyn-dope the Si wafer to form vertical P-N junctions. Prototype PN diodes were fabricated and exhibited expected blockage behavior with a knee voltage ofca.0.7 V. Our work highlights the potential of DNA nanotechnology in future fabrication of nanoelectronics.
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