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Abstract Epitaxy, a process to prepare crystalline materials in nanostructures and thin films, is the core technology for preparing high‐quality materials as a key enabler of next‐generation microelectronics and quantum information system. Progress in epitaxy has been expanding the choice of materials and their heterostructures beyond the combinations limited by materials compatibility. However, the improvement of material quality, physical implementation of materials with unique properties, and integration of incommensurate materials in an architecture have been the challenging issues. Emerging materials, including 2D materials and quantum materials, have opened opportunities to study epitaxy mechanisms and realize various functional devices. Acceleration of discovery and progress in epitaxy research should be accomplished by “understanding of epitaxy under various circumstances at multiple length scales” and “integration of experiments and models.” In the perspective, a basic summary of the status of epitaxially grown materials, the challenges in epitaxy research, and integration of modeling epitaxy and ultimate control of the epitaxy process with advanced characterization techniques are discussed. 

Abstract Wide‐bandgap semiconductors (WBGs) are crucial building blocks of many modern electronic devices. However, there is significant room for improving the crystal quality, available choice of materials/heterostructures, scalability, and cost‐effectiveness of WBGs. In this regard, utilizing layered 2D materials in conjunction with WBG is emerging as a promising solution. This review presents recent advancements in the integration of WBGs and 2D materials, including fabrication techniques, mechanisms, devices, and novel functionalities. The properties of various WBGs and 2D materials, their integration techniques including epitaxial and nonepitaxial growth methods as well as transfer techniques, along with their advantages and challenges, are discussed. Additionally, devices and applications based on the WBG/2D heterostructures are introduced. Distinctive advantages of merging 2D materials with WBGs are described in detail, along with perspectives on strategies to overcome current challenges and unlock the unexplored potential of WBG/2D heterostructures. 

Abstract Ferrimagnetic iron garnets enable magnetic and magneto‐optical functionality in silicon photonics and electronics. However, garnets require high‐temperature processing for crystallization which can degrade other devices on the wafer. Here bismuth‐substituted yttrium and terbium iron garnet (Bi‐YIG and Bi‐TbIG) films are demonstrated with good magneto‐optical performance and perpendicular magnetic anisotropy (PMA) crystallized by a microheater built on a Si chip or by rapid thermal annealing. The Bi‐TbIG film crystallizes on Si at 873 K without a seed layer and exhibits good magneto‐optical properties with Faraday rotation (FR) of −1700 deg cm⁻¹. The Bi‐YIG film also crystallizes on Si and fused SiO₂at 873 K without a seed layer. Rapidly cooled films exhibit PMA due to the tensile stress caused by the thermal expansion mismatch with the substrates, increasing the magnetoelastic anisotropy by 4 kJ m⁻³versus slow‐cooled films. Annealing in the air for 15 s using the microheater yields fully crystallized Bi‐TbIG on the Si chip. 

Si photonics has made rapid progress in research and commercialization in the past two decades. While it started with electronic–photonic integration on Si to overcome the interconnect bottleneck in data communications, Si photonics has now greatly expanded into optical sensing, light detection and ranging (LiDAR), optical computing, and microwave/RF photonics applications. From an applied physics point of view, this perspective discusses novel materials and integration schemes of active Si photonics devices for a broad range of applications in data communications, spectrally extended complementary metal–oxide–semiconductor (CMOS) image sensing, as well as 3D imaging for LiDAR systems. We also present a brief outlook of future synergy between Si photonic integrated circuits and Si CMOS image sensors toward ultrahigh capacity optical I/O, ultrafast imaging systems, and ultrahigh sensitivity lab-on-chip molecular biosensing.