Stanford, Michael G., Pudasaini, Pushpa R., Cross, Nicholas, Mahady, Kyle, Hoffman, Anna N., Mandrus, David G., Duscher, Gerd, Chisholm, Matthew F., and Rack, Philip D. Tungsten Diselenide Patterning and Nanoribbon Formation by Gas-Assisted Focused-Helium-Ion-Beam-Induced Etching. Small Methods 1.4 Web. doi:10.1002/smtd.201600060.
Stanford, Michael G., Pudasaini, Pushpa R., Cross, Nicholas, Mahady, Kyle, Hoffman, Anna N., Mandrus, David G., Duscher, Gerd, Chisholm, Matthew F., & Rack, Philip D. Tungsten Diselenide Patterning and Nanoribbon Formation by Gas-Assisted Focused-Helium-Ion-Beam-Induced Etching. Small Methods, 1 (4). https://doi.org/10.1002/smtd.201600060
Stanford, Michael G., Pudasaini, Pushpa R., Cross, Nicholas, Mahady, Kyle, Hoffman, Anna N., Mandrus, David G., Duscher, Gerd, Chisholm, Matthew F., and Rack, Philip D.
"Tungsten Diselenide Patterning and Nanoribbon Formation by Gas-Assisted Focused-Helium-Ion-Beam-Induced Etching". Small Methods 1 (4). Country unknown/Code not available: Wiley Blackwell (John Wiley & Sons). https://doi.org/10.1002/smtd.201600060.https://par.nsf.gov/biblio/10031804.
@article{osti_10031804,
place = {Country unknown/Code not available},
title = {Tungsten Diselenide Patterning and Nanoribbon Formation by Gas-Assisted Focused-Helium-Ion-Beam-Induced Etching},
url = {https://par.nsf.gov/biblio/10031804},
DOI = {10.1002/smtd.201600060},
abstractNote = {Not Available},
journal = {Small Methods},
volume = {1},
number = {4},
publisher = {Wiley Blackwell (John Wiley & Sons)},
author = {Stanford, Michael G. and Pudasaini, Pushpa R. and Cross, Nicholas and Mahady, Kyle and Hoffman, Anna N. and Mandrus, David G. and Duscher, Gerd and Chisholm, Matthew F. and Rack, Philip D.},
}
Warning: Leaving National Science Foundation Website
You are now leaving the National Science Foundation website to go to a non-government website.
Website:
NSF takes no responsibility for and exercises no control over the views expressed or the accuracy of
the information contained on this site. Also be aware that NSF's privacy policy does not apply to this site.