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Title: Electrical Characterization of Si Microwires and of Si Microwire/Conducting Polymer Composite Junctions
Award ID(s):
0802907
PAR ID:
10040928
Author(s) / Creator(s):
; ; ; ; ; ;
Date Published:
Journal Name:
The Journal of Physical Chemistry Letters
Volume:
2
Issue:
6
ISSN:
1948-7185
Page Range / eLocation ID:
675 to 680
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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  2. Si is an n-type dopant in Ga2O3 that can be introduced intentionally or unintentionally. The results of Secondary Ion Mass Spectrometry, Hall effect, and infrared absorption experiments show that the hydrogen plasma exposure of Si-doped Ga2O3 leads to the formation of complexes containing Si and H and the passivation of n-type conductivity. The Si-H (D) complex gives rise to an O-H (D) vibrational line at 3477.6 (2577.8) cm-1 and is shown to contain a single H (or D) atom. The direction of the transition moment of this defect has been investigated to provide structure-sensitive information. Theory suggests possible structures for an OH-Si complex that are consistent with its observed vibrational properties. 
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