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Title: Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
NSF-PAR ID:
10052302
Author(s) / Creator(s):
 ;  ;  ;  ;  ;  ;  ;  ;  
Publisher / Repository:
American Vacuum Society
Date Published:
Journal Name:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Volume:
35
Issue:
3
ISSN:
0734-2101
Page Range / eLocation ID:
031504
Format(s):
Medium: X
Sponsoring Org:
National Science Foundation
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