Real-time growth study of plasma assisted atomic layer epitaxy of InN films by synchrotron x-ray methods
- NSF-PAR ID:
- 10052302
- Publisher / Repository:
- American Vacuum Society
- Date Published:
- Journal Name:
- Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
- Volume:
- 35
- Issue:
- 3
- ISSN:
- 0734-2101
- Page Range / eLocation ID:
- 031504
- Format(s):
- Medium: X
- Sponsoring Org:
- National Science Foundation
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